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Fabrication and characterization of plasmonic nanostructures
Bačo, Ondřej ; Kvapil, Michal (referee) ; Dvořák, Petr (advisor)
This bachelor thesis deals with fabrication and characterization of plasmonic nanostructures. Graphene on a doped silicon substrate with a 285 nm thick layer of silicon dioxide was used for fabrication of these structures. Graphene ribbons with width in the order of hundreds of nanometers were prepared using electron beam lithography (EBL) and reactive ion etching (RIE). Steps in fabrication process were monitored utilizing optical and atomic force microscopy (AFM). Prepared graphene nanostructures were characterized with scanning electron microscope (SEM) and Fourier transform infrared spectrometer (FTIR).
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Fabrication of well defined nanoporous structures with application in membrane sensing
Fabianová, Kateřina ; Édes, Zoltán (referee) ; Sadílek, Jakub (advisor)
Theme of this bachelor thesis is focused on preparation of the metal nanomenhir structures situated in highly oriented matrix of silicon nitride nanopores based plasmonic biosensor. Porous structures were prepared by reactive ion etching of silicon nitride film using electron beam lithography prepared temporary mask as a template. Deposition of metals was handled by evaporation and magnetron sputtering and results was compared. Finally, this work assumes reached results including successful approach of sensor preparation without contamination of surrounding surface by heavy metal ions.
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Fabrication of graphene mid-infrared biosensor
Gallina, Pavel ; Hrabovsk, Milo (referee) ; Sadlek, Jakub (advisor)
The main subject of this bachelor's thesis was fabrication and measurement of response of graphene plasmonic biosensor prepared on flat and curved surfaces. Graphene produced by chemical vapour deposition (CVD) method was used for preparation of these sensors. The structures were fabricated using electron beam (EBL) and optical lithography, reactive ion etching (RIE) and magnetron sputtering. The resultant sensors were then observed in electron (SEM) and optical microscope, the topography was surveyed in atomic force microscope (AFM) and the measurement was carried out by Fourier transform infrared spectoscopy (FTIR).
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Mechanical design of measurement system for reactive ion etching system
Maňka, Tadeáš ; Antoš, Martin (referee) ; Šerý, Mojmír (advisor)
The aim of this work is to design fully working measuring system for the reactive ion etching system (RIE). The Michelson interfometer, previously developed in Ústav přístrojové techniky, v.v.i., is used in this work. The theoretical part is aimed at description of interferometric methods for precise measuring of length. In next part the etching proces with RIE is described. In practical part the testing system was constructed from the parts of Thorlabs company . The functionality was controlled with this system and the results of measuring were compared with the profilometer. In next step technical drawings were created and the whole system was made.
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