National Repository of Grey Literature 54 records found  1 - 10nextend  jump to record: Search took 0.01 seconds. 
Thomson Scattering Diagnostic on COMPASS Tokamak
Aftanas, Milan ; Stöckel, Jan (advisor) ; Mlynář, Jan (referee) ; Wild, Jan (referee)
Thorough study of plasma behaviour in magnetically confined fusion devices is of great importance in recent research. Diagnostics capable to reliably provide important parameters of the hot plasma are key tool in the effort to control fusion energy on Earth. Thomson Scattering diagnostic has a credit of being a complex design diagnostic with reliable measurement of electron temperature and density profiles. The main subjects of this thesis are design of the Thomson Scattering system for the COMPASS tokamak, analysis of output data errors and exploitation of the data to study plasma behaviour. Besides this work, the author has been involved in the design of Thomson Scattering systems for the ITER tokamak and this design is presented here as well. Powered by TCPDF (www.tcpdf.org)
Summary Research Report
Brůna, Josef ; Wild, Jan ; Hederová, Lucia ; Klinerová, Tereza ; Macek, Martin ; Urbanová, Renáta
The result has mainly a documentary and supporting role for further use of the main result - the microclimatic map. It documents the conditions of its creation and contains other valuable data. The research report will serve as a basis for evaluating the impact of microclimate on forest regeneration, protected species and forest habitats.
Natural regeneration of spruce stands in Vysoké Tatry (High Tatras) after large scale disturbation
Michalová, Zuzana ; Weiser, Martin (advisor) ; Wild, Jan (referee)
The observational study on natural regeneration of Norway spruce (Picea abies) was provided during seasons 2010 and 2011 in the windthrow area of High Tatra National Park. The main aim of this master thesis was to describe the distribution pattern in Norway spruce regeneration as well as to estimate the spatial scale, which most preciselly describes the differences in its phenotypic variability. Following step was to determine the relative influence of abiotic and stand factors on the growth characteristics and abundance of spruce seedlings. The Main focus lied on stressing the role of biotic interactions, like intraspecific and interspecific competition, leading to certain discrepancies in the phenotype, as well as in abundance of spruce seedlings.The reponse in variability in spruce traits was recognized at each spatial level. The results showed clear causality between soil moisture and vegetation composition, which both directly modified not only the phenotype of spruce seedlings and plants, but have even influenced their counts on particular stands.
Sputtering of dust grains and its consequences for space processes.
Vyšinka, Marek ; Šafránková, Jana (advisor) ; Stöckel, Jan (referee) ; Wild, Jan (referee)
Title: Sputtering of dust grains and its consequences for space processes Author: Marek Vyšinka Department: Department of Surface and Plasma Science Supervisor: prof. RNDr. Jana Šafránková, DrSc., Department of Surface and Plasma Science Abstract: A great part of matter in a space has a form of dust grains, tiny pieces of rocks with the dimensions of hundreds nanometers to hundreds micrometers. In this environment dust grains undergo collisions with energetic particles (electron, ions, UV photons) that leads to their charging and modification. The presented thesis studies ion-dust interactions and is focussed on dust grain modification through ion implantation and its destruction via sputtering process. Two compu- ter models are presented - first for computing the ion implantation profile in the grain and second, for the shape of the sputtered grain lying on the surface of a bigger object. The resulting shape of the grain is compared with that obtained experimentally. Important results of the thesis are measured sputtering yields for spherical SiO2 grains at several surface potentials obtained by simultaneous ion and electron bombardments. Keywords: ions, dust grains, sputtering, sputtering yield, implantation profile 1

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