Národní úložiště šedé literatury Nalezeno 1 záznamů.  Hledání trvalo 0.02 vteřin. 
Design and fabrication of dielectric metasurfaces for ultraviolet wavelengths
Idesová, Beáta ; Ren,, Haoran (oponent) ; Ligmajer, Filip (vedoucí práce)
This thesis explores metasurfaces operating at ultraviolet (UV) wavelengths as alternatives to conventional optical elements like lenses or holograms. Metasurfaces offer advantages over traditional optical elements such as a reduced footprint of optical systems or multifunctionality within a single device. We start this work with a literature review devoted to UV metalenses and UV metaholograms. We mainly focus on HfO2 and AlN material platforms because of their high index of refraction (>2) and low losses down to deep-UV region, and we compare fabrication approaches involving these materials. The most promising fabrication recipes were optimized in the practical part of the thesis: HfO2 metasurfaces were fabricated using atomic layer deposition into masks pre-patterned by electron beam lithography, while AlN metasurfaces were etched through hard chromium masks. We demonstrated successful fabrication of HfO2 metalenses made of high aspect-ratio nanopillars with circular cross-sections, while the fabrication of AlN metasurfaces faced challenges, which were thoroughly discussed as well. Characterization of the final HfO2 metalenses in terms of intensity profiles was done in a custom-made experimental optical setup. The metalenses showed promising performance for the wavelength 325 nm, although slight deviations from the design were observed and are discussed in the context of theoretical calculations. The findings of this work emphasize the importance of thorough optimization for the future fabrication of UV metasurfaces.

Chcete být upozorněni, pokud se objeví nové záznamy odpovídající tomuto dotazu?
Přihlásit se k odběru RSS.