|
|
Optimization of a high current pulse discharge in gas filled capillary for application purposes - Ar8+ laser 46.9 nm
Štraus, Jaroslav ; Koláček, Karel (advisor) ; Jančárek, Alexandr (referee) ; Wild, Jan (referee)
The aim of the thesis was to complete the development of the Czech version of the extremal ultraviolet (XUV) argon capillary laser working at the wavelength 46.9 nm and its adaptation for the first practical applications. A multi-discipline complex of mutually interconnected problems was analyzed and studied: The reasons for a capillary low life-time were investigated using defectoscopic methods, a pre- pulse regime influence was studied with the help of spectroscopy on a physical model. By performing necessary construction and technology changes as well as by the multi-parametric optimisation of working regime, the indicated weaknesses were suppressed. The XUV laser was focused into a footprint of the size about 100 µm and the apparatus was extended by a set of practical aids and accessories for special applications, especially for exposition of the samples at extreme temperatures. As practical applications of the XUV laser, measurements of multilayer mirror reflectivity and filter transmissivity were performed. Using the XUV laser for a thin layer deposition and radiation resistance testing was verified to be practicable in principle. Probably a first temperature dependence of an XUV laser ablation rate was measured, in the temperature range from -180 deg.C to +200 deg.C, on BaF2.
|
|
|
Optimization of a high current pulse discharge in gas filled capillary for application purposes - Ar8+ laser 46.9 nm
Štraus, Jaroslav ; Koláček, Karel (advisor) ; Jančárek, Alexandr (referee) ; Wild, Jan (referee)
The aim of the thesis was to complete the development of the Czech version of the extremal ultraviolet (XUV) argon capillary laser working at the wavelength 46.9 nm and its adaptation for the first practical applications. A multi-discipline complex of mutually interconnected problems was analyzed and studied: The reasons for a capillary low life-time were investigated using defectoscopic methods, a pre- pulse regime influence was studied with the help of spectroscopy on a physical model. By performing necessary construction and technology changes as well as by the multi-parametric optimisation of working regime, the indicated weaknesses were suppressed. The XUV laser was focused into a footprint of the size about 100 µm and the apparatus was extended by a set of practical aids and accessories for special applications, especially for exposition of the samples at extreme temperatures. As practical applications of the XUV laser, measurements of multilayer mirror reflectivity and filter transmissivity were performed. Using the XUV laser for a thin layer deposition and radiation resistance testing was verified to be practicable in principle. Probably a first temperature dependence of an XUV laser ablation rate was measured, in the temperature range from -180 deg.C to +200 deg.C, on BaF2.
|
|
| |
|
| |
|
| |
|
| |
|
| |
guest ::
