Home > Search Results: keywords:"flowrate"
Search:
Search Tips :: Advanced Search
Search collections:
Sort by: Display results: Output format:
National Repository of Grey Literature 2 records found  Search took 0.02 seconds. 
Implementace vypařovacího systému pro depozice tenkých vrstev
 CIFREUND, David
This thesis focuses on gas dispensing for PECVD proceses in low temperature plasma. Key to succesful depositions is an accurate and stable flow rate of precursor to reactor, where discharges are used for depositions of thin films. Liquid can be also an admixture of the precursor, but it has to be mixed with the carrier gas and finaly evaporated. For this purpose was chosen CEM evaporating system from Bronkhorst High-Tech B.V., which is composed of gas mass flow controller, liquid mass flow controller, evaporating device and control unit. Main goal of this thesis is to implement evaporating system to plasma chemical reactor, calibrate it and do measuring tests.
Detailed record
Určení objemového průtoku vazkoplastických kapalin mezikružím za pomoci aditivní metody
 Filip, Petr ; David, Jiří
An additive method enabling a direct determination of axial flow rate for viscous (power-law model) and viscoplastic (Vočadlo model) fluids in concentric annuli is presented. Flow rate through the actual concentric annulus is possible to express as a sum of axial flow rates through individual partial concentric annuli forming the whole annulus. The resulting relation for axial flow rate is possible to express in analytical forms without necessity of otherwise complicated derivations. The only numerical calculation consists in a determination of location of a zero shear stress for the original whole concentric annulus.
Detailed record

Interested in being notified about new results for this query?
Subscribe to the RSS feed.
Digital Repository :: Search :: Submit :: Personalize :: Help
Powered by Invenio v1.1.2
Maintained by admin.invenio@techlib.cz
This site is also available in the following languages:
Česky  English