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Properties of metal layers realized with vapour deposition
Milichovský, Miloš ; Švecová, Olga (referee) ; Šandera, Josef (advisor)
This work deals with vacuum evaporation of metals, basic principles of this technology and exploring the properties of the resulting layer. It describes how vacuum evaporation works and its individual parts.The main part deals with evaporation of copper and other substances and the conductivity of the resulting film in relation to its thickness. As a parameter for measuring substrate temperature is specified.
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Mechanical and Electrical Properties of Thin Metal Films Deposited by Vacuum Evaporation
W. F. Yahya, Doaa ; Kolařík, Vladimír (referee) ; Štencl,, Jiří (referee) ; Šandera, Josef (advisor)
Thin layers are widely used in many fields of technology and today we can say that they are found in all modern technologies. Thin layers can be created in two ways, namely by chemical or physical means. This work focuses on the latter method, more particularly a technology of thermal evaporation of thin layers in a vacuum. The work focuses on the process principles during and after the evaporation. Much of the work focuses on the development and design of experiments. These experiments illustrate some of the phenomena that take place on thin films produced by the aforementioned technology. Work helps to better understand processes during formation of thin layers and properties that influence the quality and stability of thin films. In conclusion we describe results of experiments and new developments in the field of thin films deposition using evaporation under vakuum are summarized.
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Properties of metal layers realized with vapour deposition
Milichovský, Miloš ; Švecová, Olga (referee) ; Šandera, Josef (advisor)
This work deals with vacuum evaporation of metals, basic principles of this technology and exploring the properties of the resulting layer. It describes how vacuum evaporation works and its individual parts.The main part deals with evaporation of copper and other substances and the conductivity of the resulting film in relation to its thickness. As a parameter for measuring substrate temperature is specified.
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|
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Mechanical and Electrical Properties of Thin Metal Films Deposited by Vacuum Evaporation
W. F. Yahya, Doaa ; Kolařík, Vladimír (referee) ; Štencl,, Jiří (referee) ; Šandera, Josef (advisor)
Thin layers are widely used in many fields of technology and today we can say that they are found in all modern technologies. Thin layers can be created in two ways, namely by chemical or physical means. This work focuses on the latter method, more particularly a technology of thermal evaporation of thin layers in a vacuum. The work focuses on the process principles during and after the evaporation. Much of the work focuses on the development and design of experiments. These experiments illustrate some of the phenomena that take place on thin films produced by the aforementioned technology. Work helps to better understand processes during formation of thin layers and properties that influence the quality and stability of thin films. In conclusion we describe results of experiments and new developments in the field of thin films deposition using evaporation under vakuum are summarized.
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