National Repository of Grey Literature 97 records found  beginprevious71 - 80nextend  jump to record: Search took 0.00 seconds. 
An Amplitude-Phase Vortex Photo Mask
Krátký, Stanislav ; Meluzín, Petr ; Urbánek, Michal ; Matějka, Milan ; Chlumská, Jana ; Horáček, Miroslav ; Kolařík, Vladimír
The issue of phase photo masks was presented in previous editions of this conference: computer-generated holograms and phase masks to produce fiber Bragg gratings. In this contribution, we will focus on the presentation of results achieved in the preparation of glass masks combining two parts on one substrate: the amplitude portion and the phase portion of a vortex photo mask. Both portions are prepared by electron-beam lithography.
SMV-2014-28: Development of test specimens for SEM
Matějka, Milan ; Horáček, Miroslav ; Meluzín, Petr ; Chlumská, Jana ; Král, Stanislav ; Kolařík, Vladimír ; Urbánek, Michal ; Krátký, Stanislav
The aim of the work was the research/development and realisation of precise relief structure for testing imaging of scanning electron microscopes (SEM) using microlithographic techniques of recording in the silicon. Research includes analysis of graphical input with respect of their use for testing of SEM imaging metric, research of appropriate techniques and procedures suitable for the preparation of relief elements in the silicon with high accuracy and repeatability.
SMV-2014-01: Relief structures based on diffractive optics
Horáček, Miroslav ; Kolařík, Vladimír ; Matějka, Milan ; Urbánek, Michal ; Krátký, Stanislav ; Chlumská, Jana ; Meluzín, Petr ; Král, Stanislav
Research and development in the field of physical realization of graphic and optical structures based on the principle of diffractive optics by means of electron beam lithography in a recording material supported by a silicon or glass board. The research covers the analysis of the graphical or optical motive, research and application of relief structures implementing the required graphic and optical properties, research and modeling of the physical possibilities of implementation of relief structures, preparation and analysis of technology of implementation of relief structures with regard to the limits of current scientific instruments, verification of theoretical considerations by means of relief structure sample exposure.
SMV-2012-12: Testing specimens for SEM
Matějka, Milan ; Kolařík, Vladimír ; Urbánek, Michal ; Krátký, Stanislav ; Chlumská, Jana ; Horáček, Miroslav ; Král, Stanislav
Research and development in the field of relief testing structures on Silicon wafer. The specimen is to be used for testing of metrics of scanning electron microscopes (SEM) as well as for the calibration of the SEM view of field. The samples are prepared by means of electron-beam lithography and related techniques.
SMV-2013-15: Relief structures based on diffractive optics
Horáček, Miroslav ; Kolařík, Vladimír ; Matějka, Milan ; Urbánek, Michal ; Krátký, Stanislav ; Chlumská, Jana ; Král, Stanislav
Research and development in the field of physical realization of graphic and optical structures based on the principle of diffractive optics by means of electron beam lithography in a recording material supported by a silicon or glass board. The research covers the analysis of the graphical or optical motive, research and application of relief structures implementing the required graphic and optical properties, research and modeling of the physical possibilities of implementation of relief structures, preparation and analysis of technology of implementation of relief structures with regard to the limits of current scientific instruments, verification of theoretical considerations by means of relief structure sample exposure.
SMV-2012-05: Relief structures based on diffractive optics
Horáček, Miroslav ; Kolařík, Vladimír ; Matějka, Milan ; Urbánek, Michal ; Krátký, Stanislav ; Chlumská, Jana ; Král, Stanislav
Research and development in the field of physical realization of graphic and optical structures based on the principle of diffractive optics by means of electron beam lithography in a recording material supported by a silicon or glass board. The research covers the analysis of the graphical or optical motive, research and application of relief structures implementing the required graphic and optical properties, research and modeling of the physical possibilities of implementation of relief structures, preparation and analysis of technology of implementation of relief structures with regard to the limits of current scientific instruments, verification of theoretical considerations by means of relief structure sample exposure.
Testing specimens for SEM
Kolařík, Vladimír ; Matějka, Milan ; Urbánek, Michal ; Krátký, Stanislav ; Chlumská, Jana ; Horáček, Miroslav ; Král, Stanislav
Research and development in the field of relief testing structures on Silicon wafer. The specimen is to be used for testing of metrics (dimensions and orthogonality) of scanning electron microscopes (SEM) as well as for the calibration of the SEM view of field. A set of samples is prepared on a Silicon wafer by means of electron-beam lithography and related techniques. The specimens are individually finalized. Related research and development in the field of accuracy assessment and control as well as tolerance measurements in the micron domain; Calibration Certificate.
SMV-2013-01: Relief structures based on diffractive optics
Horáček, Miroslav ; Kolařík, Vladimír ; Matějka, Milan ; Urbánek, Michal ; Krátký, Stanislav ; Chlumská, Jana ; Král, Stanislav
Research and development in the field of physical realization of graphic and optical structures based on the principle of diffractive optics by means of electron beam lithography in a recording material supported by a silicon or glass board. The research covers the analysis of the graphical or optical motive, research and application of relief structures implementing the required graphic and optical properties, research and modeling of the physical possibilities of implementation of relief structures, preparation and analysis of technology of implementation of relief structures with regard to the limits of current scientific instruments, verification of theoretical considerations by means of relief structure sample exposure.
Structural Color of Metallic Surfaces
Kolařík, Vladimír ; Horáček, Miroslav ; Urbánek, Michal ; Matějka, Milan ; Krátký, Stanislav ; Chlumská, Jana ; Bok, Jan
Nano structuring of metallic surfaces shows surface colors unusual for a given material. This study presents an overview of possible approaches to achieve desirable color changes. The nano structured relief structures prepared by means of electron beam lithography process are presented. Optical design and simulation of optical properties, data preparation for e-beam patterning, parameters of the writing process, and technological issues are presented in detail. Finally, real examples of structures that exhibit surface color changes are presented and discussed.
E-beam Nano-patterning for Electroforming Replication
Krátký, Stanislav ; Kolařík, Vladimír ; Urbánek, Michal ; Paták, Aleš ; Horáček, Miroslav ; Matějka, Milan
This contribution deals with nano-patterning by the way of electron beam lithography with satisfying requirements for electroforming replication of desired patterns. Electron beam lithography can be used for creating nano graphics (images, text etc.) due to its very high resolution and precision. However, patterns created by electron beam lithography cannot be applied for mass production directly because of resist material soft nature (usually a polymer material). Because of that, hard printing plate must be produced. Nickel plate prepared by electroforming is one of the ways to accomplish that. Prior to the production of nickel plate by electroforming, the surface of polymer material has to be covered by a sufficiently thick layer of metal. This procedure can lead to a partial destruction of the motif (completely covered by metal) thus the decreasing of nano graphics resolution. In this paper several nano graphics (images and text with various resolutions) are prepared in positive resist PMMA (thickness of 2000 nm) by e-beam lithography. Chemical developer (pentyl acetate) was used for wet developing of prepared patterns. The sputtering of silver (100 nm) was carried out to achieve sufficient thickness of conductive layer for electroforming. Electron scanning microscope was used for evaluation, which one of the images and texts are still recognizable.

National Repository of Grey Literature : 97 records found   beginprevious71 - 80nextend  jump to record:
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2 Krátký, Štěpán
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