National Repository of Grey Literature 97 records found  previous11 - 20nextend  jump to record: Search took 0.01 seconds. 
Fiber gratings for sensing and design of nonlinear structures
Helán, R. ; Šifta, R. ; Urban, F. ; Urban jr., F. ; Mikel, Břetislav ; Krátký, Stanislav ; Kolařík, Vladimír
This paper focuses on the research and development of optical nonlinear FBG structures using the so-called nonlinear chirp, which produces the desired type of filter. Such created nonlinear structures can shape the spectrum of an optical radiation source intended to evaluate FBG-based sensors.
Study of the influence of geometrical parameters of phase binary gratings on their optical response for the preparation of optical fiber sensors
Krátký, Stanislav ; Kolařík, Vladimír ; Mikel, Břetislav ; Helán, R. ; Urban, F.
For exposure to optical fibers through a phase grating, it is necessary to tune the geometrical parameters of the grating very well. In this paper, we study the effect of the grating period, grating diameter, grating depth, and polarisation of the incident laser beam on the efficiency of diffraction orders. A suitably tuned grating generates diffraction orders with the desired efficiency, thereby guaranteeing the formation of the desired motif in the exposed optical fiber.
SMV-2021-31: TELIGHT aiming pattern
Matějka, Milan ; Horáček, Miroslav ; Chlumská, Jana ; Kolařík, Vladimír ; Krátký, Stanislav
The field of development concerns the realization of precise relief structures using electron lithography and reactive ion etching. Development of technology for the creation of a precise phase filter of the plane-parallel type for optical applications by modification of quartz substrates by means of precise dry etching.
SMV-2021-07: Relief microstructures based on diffractive optics
Horáček, Miroslav ; Kolařík, Vladimír ; Matějka, Milan ; Krátký, Stanislav ; Chlumská, Jana ; Meluzín, Petr ; Král, Stanislav
Research and development in the field of physical realization of graphic and optical structures based on the principle of diffractive optics by means of electron beam lithography in a recording material supported by a silicon or glass board. The research covers the analysis of the graphical or optical motive, research and application of relief structures implementing the required graphic and optical properties, research and modeling of the physical possibilities of implementation of relief structures, preparation and analysis of technology of implementation of relief structures with regard to the limits of current scientific instruments, verification of theoretical considerations by means of relief structure sample exposure.
SMV-2021-01: Relief structures based on diffractive optics
Horáček, Miroslav ; Kolařík, Vladimír ; Matějka, Milan ; Krátký, Stanislav ; Chlumská, Jana ; Meluzín, Petr ; Král, Stanislav
Research and development in the field of physical realization of graphic and optical structures based on the principle of diffractive optics by means of electron beam lithography in a recording material supported by a silicon or glass board. The research covers the analysis of the graphical or optical motive, research and application of relief structures implementing the required graphic and optical properties, research and modeling of the physical possibilities of implementation of relief structures, preparation and analysis of technology of implementation of relief structures with regard to the limits of current scientific instruments, verification of theoretical considerations by means of relief structure sample exposure.
SMV-2021-03: Development of test specimens for SEM
Matějka, Milan ; Horáček, Miroslav ; Chlumská, Jana ; Kolařík, Vladimír ; Krátký, Stanislav
Research and development of accurate calibration samples with relief structures. The samples are intended for parameter calibration of scanning electron microscope (SEM). Testing patterns allow to check and calibrate magnification, orthogonality and geometric distortion. New tools for handling during technological operations of resist deposition and etching were developed. Optimization was reached in the process of transfer of the relief structure into silicon via anisotropic etching, due modification of etching apparatus. Standardized procedures for inspection and quality control were developed.
Patterning of conductive nano-layers on garnet
Chlumská, Jana ; Lalinský, Ondřej ; Matějka, Milan ; Krátký, Stanislav ; Kolařík, Vladimír
Synthetic crystalline materials of the garnet group are used as scintillators in scanning electron microscopy. If a thick conductive layer is applied on the garnet surface, slower electrons don't have enough energy to pass through this relatively thick conductive layer on the scintillator surface. Therefore, either thinner conductive layer or appropriate patterning of the thicker layer has to be used. Within this contribution we study the patterning process of such conductive nano-layer. Resolution of the patterning process is of high interest. Two approaches are compared: direct writing electron beam lithography and mask projection UV lithography.
Combined Electron Beam Lithography
Krátký, Stanislav ; Mikulík, Petr (referee) ; Škereň,, Marek (referee) ; Kolařík, Vladimír (advisor)
This thesis deals with grayscale e-beam lithography and diffractive optical elements fabrication. Three topics are addressed. The first topic is combined grayscale e-beam lithography. The goal of this task is combining exposures performed by two systems with various beam energies. This combined technique leads to a better usage of both systems because various structures can be more easily prepared by one electron beam energy than by the other. The next topic is the optimization of shape borders of exposing structures that are defined by image input. The influence of such optimization on exposure data preparation is evaluated, as well as the exposure time and the change of optical properties of testing structures. The possibility of deep multilevel diffractive optical element fabrication in plexiglass blocks is researched as the third topic. Plexiglass can replace the system of a resist and a substrate. A new approach to writing down the structures by electron beam is presented, minimizing thermal stress on the plexiglass block during the exposure. The writing method also improves the homogeneity of exposed motifs. A method for computing the exposure dose for specific multilevel structures was designed. This method is based on the existing model of proximity effect computation and it minimizes the computing time necessary to obtain the exposure doses.
SMV-2020-24: Development of test specimens for SEM
Matějka, Milan ; Horáček, Miroslav ; Meluzín, Petr ; Chlumská, Jana ; Král, Stanislav ; Kolařík, Vladimír ; Krátký, Stanislav ; Knápek, Alexandr
Development in the field realization of precise relief structures in the silicon dedicated to the testing of the scanning electron microscopes (SEM) deflection field and accuracy. Micro-lithographic techniques for the recording of patterns in the silicon were used. New tools for handling during technological operations of resist deposition and etching were developed. Optimization was reached in the process of transfer of the relief structure into silicon via anisotropic etching, due modification of etching apparatus. Standardized procedures for inspection and quality control were developed.
SMV-2020-23: Development of test specimens for SEM
Matějka, Milan ; Horáček, Miroslav ; Meluzín, Petr ; Chlumská, Jana ; Kolařík, Vladimír ; Krátký, Stanislav ; Pokorná, Zuzana
Development in the field realization of precise relief structures in the silicon dedicated to the testing of the scanning electron microscopes (SEM) deflection field and accuracy. Micro-lithographic techniques for the recording of patterns in the silicon were used. New tools for handling during technological operations of resist deposition and etching were developed. Optimization was reached in the process of transfer of the relief structure into silicon via anisotropic etching, due modification of etching apparatus. Standardized procedures for inspection and quality control were developed.

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2 Krátký, Štěpán
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