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Fabrication of plasmonic antennas for analytical transmission electron microscopy by focused ion beam lithography
Foltýn, Michael ; Kejík, Lukáš (referee) ; Horák, Michal (advisor)
This bachelor thesis is focused on sputtering of thin gold layers and manufacturing of plasmonic antennas using focused ion beam lithography. I optimised the process of sputtering of gold layers by ion beam assisted deposition. Furthermore, I optimised processes connected to manufacturing of plasmonic antennas by focused ion beam lithography. I sputtered thin gold layers 20, 30 and 40 nm thick by various deposition rates. In terms of grain size, the best layers were those deposited with rate of 2 /s. From view of crystallographic composition, the best results were achieved by using deposition rates of 0.2 and 3 /s. I made 3 types of antennas. Rod shaped antennas of 240 nm in length and widths of 40 and 80 nm, and bowtie antenna with 20 nm gap in between its wings. I further optimised parameters of ion etching for each thickness and deposition rate of sputtered layers used for creating antennas mentioned before. The highest quality of antennas was achieved when using layers 20 and 40 nm thick. For manufacturing of bowtie antennas however, layers of all thicknesses deposited by rate of 3 /s were optimal. I discovered, that for layers deposited with rate of 2 /s a lot of redeposited material got sputtered back on to antennas, which can bring the diameters of antennas closer to the desired value at least in one axis.
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Fabrication of plasmonic antennas for analytical transmission electron microscopy by focused ion beam lithography
Foltýn, Michael ; Kejík, Lukáš (referee) ; Horák, Michal (advisor)
This bachelor thesis is focused on sputtering of thin gold layers and manufacturing of plasmonic antennas using focused ion beam lithography. I optimised the process of sputtering of gold layers by ion beam assisted deposition. Furthermore, I optimised processes connected to manufacturing of plasmonic antennas by focused ion beam lithography. I sputtered thin gold layers 20, 30 and 40 nm thick by various deposition rates. In terms of grain size, the best layers were those deposited with rate of 2 /s. From view of crystallographic composition, the best results were achieved by using deposition rates of 0.2 and 3 /s. I made 3 types of antennas. Rod shaped antennas of 240 nm in length and widths of 40 and 80 nm, and bowtie antenna with 20 nm gap in between its wings. I further optimised parameters of ion etching for each thickness and deposition rate of sputtered layers used for creating antennas mentioned before. The highest quality of antennas was achieved when using layers 20 and 40 nm thick. For manufacturing of bowtie antennas however, layers of all thicknesses deposited by rate of 3 /s were optimal. I discovered, that for layers deposited with rate of 2 /s a lot of redeposited material got sputtered back on to antennas, which can bring the diameters of antennas closer to the desired value at least in one axis.
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