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Nanodiamond seeding of rough substrates
 Vlčková, M. ; Stefanovič, M. ; Petrák, V. ; Fendrych, František ; Taylor, Andrew ; Fekete, Ladislav ; Nesládek, M.
Efficient growth of nanocrystalline diamond (NCD) requires nucleation enhancement before chemical vapour deposition step. Nanodiamond (ND) seeding is a commonly used technique that yields high nucleation densities. This technique is well established for conventional planar substrates with low surface roughness. However, many engineering application requires NCD grow on rough and/or non-planar substrates. In this work, we investigate quality of nanodiamond seeding on silicon substrates of high surface roughness (RMS roughness <1 mm). Seeded substrates and deposited diamond films were analysed by atomic force microscopy (AFM), scanning electron microscopy (SEM) and Raman spectroscopy. We discuss influence of nanodiamond particles in seeding solution and seeding technique on nucleation density and quality of deposited NCD film.
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