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Characterization of highly porous Pd-modified SnO2 sputtered thin films for H2 detection
Chundak, Mykhailo ; Veltruská, Kateřina (advisor) ; Jiříček, Petr (referee) ; Šmíd, Břetislav (referee)
Title: Characterization of highly porous Pd-modified SnO2 sputtered thin films for H2 detection Autor: Mgr. Mykhailo Chundak Department/Institute: Department of Surface and Plasma Science Supervisor of the doctoral thesis: RNDr. Kateřina Veltruská, CSc., Department of Surface and Plasma Science Abstract: This doctoral thesis contains the study of tin dioxide and Pd-doped tin dioxide samples deposited by magnetron sputtering utilizing glancing angle deposition (GLAD). Influence of the deposition parameters on the change of morphology, crystalline structure and chemical state was studied. The samples were characterized by a variety of techniques, such as: X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS), synchrotron radiation photoelectron spectroscopy (SRPES), scanning electron microscopy (SEM) and high resolution transmission electron microscopy (HRTEM). Prepared samples showed high porosity which could be controlled by deposition parameters (angle of the deposition, gas pressure and power of magnetron discharge). Highly porous SnO2 GLAD samples and Pd modified SnO2 GLAD samples were deposited on the substrates at room temperature and 300 řC. These samples were found to be polycrystalline with certain fraction of amorphous contribution, given by preparation conditions. The size of the...
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Surface modification by means of metallic and polymeric nanoparticles
Steinhartová, Tereza ; Hanuš, Jan (advisor) ; Matoušek, Jindřich (referee)
The theoretical part deals with basic characteristics of low-temperature, low-pressure plasma. It also describes the principles of preparation of polymer and nanocomposite films using this type of plasma. It further explains the basic principles of methods used to characterize our samples. The experimental section shows a technology to produce hard polymeric coatings with metal (Cu) nanoparticles (NPs) fabricated by gas aggregation source (GAS). This approach has an important advantage that Cu concentration and matrix properties can be controlled independently. Characterization of the films in terms of chemical composition, morphology, optical and mechanical properties is described here alongside with description of Cu NPs production using GAS with variable aggregation length. The a- C:H matrix was deposited in a mixture of Ar and n-hexane on the substrates placed on a RF electrode. The beam of the NPs was normal to the substrate plane. In this arrangement it was possible to control hardness of the films and by operational parameters of the GAS also the amount of the NPs in the film. In the last section fabrication of nanocomposite films of titanium and nylon NPs is shown. Powered by TCPDF (www.tcpdf.org)
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Deposition of thin metal layers by vacuum magnetron sputtering device
Rogozhnikova, Mariia ; Hylský, Josef (referee) ; Strachala, Dávid (advisor)
This bachelor’s thesis is focused on description of magnetron sputtering device NP 12 for the thin metal layers forming. In this work is mentioned the issue of metal layers, is given an overview of the methods of their forming and description of magnetron sputtering. Practical part of this thesis describes creation of the NP 12 sputtering device controlling instructions and creation of ten working samples. Copper, aluminum, and titanium layers were sputtered on a glass and silicon substrate bases. An appropriate processing parameters have been defined experimentally. The conclusion of this final work gives analyzes of surface flatness and purity of the sputtered layers using AFM and SEM measurements methods.
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Ultrathin films deposited by means of magnetron sputtering and their characterization
Petr, Martin ; Kylián, Ondřej (advisor) ; Straňák, Vítězslav (referee) ; Tichý, Milan (referee)
Presented work is focused on the deposition and characterization of thin and ultrathin plasma polymer films, then also on the preparation of nanocomposites metal/plasma polymer. The characterization of plasma polymer films was partly done in-situ without exposing the samples to the atmosphere. The thickness of prepared films was measured by spectral ellipsometry, the chemical composition was measured by XPS. The morphology and optical properties of deposited films were measured ex-situ. It is shown that during the initial stages of growth the properties of plasma polymer films depend on their thickness and also on the material of the substrate. Many interesting applications were explored for prepared nanocomposites metal/plasma polymer. They can be used as superhydrophobic coatings, gradient coatings, substrates for Raman spectroscopy or as antibacterial coatings. Moreover, special optical properties of prepared nanocomposites were studied in detail. Presented work has an experimental character.
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Study of new catalytic materials for proton exchange membrane fuel cells
Homola, Petr ; Matolín, Vladimír (advisor) ; Jiříček, Petr (referee)
Title: Study of new catalytic materials for proton exchange membrane fuel cells Author: Petr Homola Department: Department of Surface and Plasma Science Supervisor: Prof. RNDr. Vladimír Matolín, DrSc. Abstract: Submitted thesis deals with study of thin layers based on platinum and cerium oxides in order to use them in fuel cells with polymer membrane (PEM- FC). A set of samples with different amount of platinum was prepared by means of magnetron sputtering. Samples were investigated by X - ray Photoelectron Spectroscopy (XPS) and results were confronted with sputtering parameters. It was found out that chemical state of platinum is related to its amount in thin layer. The less platinum was contained in thin layer, the less amount of Pt0 state was observed and amounts of Pt2+ and Pt4+ states increased. Furthermore the temperature stability of prepared layers in the interval from room temperature to 250 ◦ C was studied by means of XPS. The adsorption of carbon monoxide was measured by infrared absorption spectroscopy (IRAS). Increasing degree of adsorption on sample probably related to platinum reduction with increased tem- perature was observed. Measurements of other samples were devaluated by strong contamination with nickel carbonyls. Keywords: PEMFC, cerium oxide, magnetron sputtering, XPS, CO adsorption
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Characterization of Nanostructures Deposited by High-Frequency Magnetron sputtering
Hégr, Ondřej ; Boušek, Jaroslav (advisor)
This thesis deals with the analysis of nano-structured layers deposited by high-frequency magnetron sputtering on the monocrystalline silicon surface. The content of the work focuses on the magnetron sputtering application as an alternative method for passivation and antireflection layers deposition of silicon solar cells. The procedure of pre-deposite silicon surface cleaning by plasma etching in the Ar/H2 gas mixture atmosphere is suggested. In the next step the silicon nitride and aluminum nitride layers with hydrogen content in Ar/N2/H2 gas mixture by magnetron sputtering are deposited. One part of the thesis describes an experimental pseudo-carbide films deposition from a silicon target in the atmosphere of acetylene (C2H2). An emphasis is placed on the research of sputtered layers properties and on the conditions on the silicon-layer interface with the help of the standard as well as special measurement methods. Sputtered layers structure is analyzed by modern X-ray spectroscopy (XPS) and by Fourier infrared spectroscopy (FTIR). Optical ellipsometry and spectrophotometry is used for the diagnostic of the layers optical properties depending upon the wavelength of incident light. A special method of determining the surface lay-out of the charge´s carrier life in the volume and on the surface of silicon is employed to investigate the passivating effects of the sputtered layers.
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Thermal stability of sputtered yttrium oxide layers
Kršňák, Jiří ; Boušek, Jaroslav (referee) ; Hégr, Ondřej (advisor)
This work deals with behavior of deposited yttrium oxide thin film after heat stress. Within solution thin yttrium oxide films were deposited at silicon substrates, which were exposed to various cycles of heat stress. Tested structures were investigated before and after heat stress in term of surface topography stability with the hepl of electron microscopy.
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Optimization of thin films of metal oxide materials
Vítek, Jiří ; Šimonová, Lucie (referee) ; Šubarda, Jiří (advisor)
This thesis is focused on the description of the method of reactive sputtering of thin films. Currently, there are many ways how to create thin films and there are many applications of thin films in various industrial sectors. In this paper at the first are listed the issue of thin films, followed by an overview of the deposition techniques and of the chemical analysis of deposited thin films. It also describes the four-point measurement method of sheet resistance, mechanical test of adhesion and optical properties. At the end of the theoretical part are described the material composition of the deposited films. The goal of the practical part is to optimize the deposition process of the mixed layer of indium tin oxide (In2O3: SnO2) and contribute to the overall understanding of the influence of annealing on the layer. There were created six series of samples with that applied layers. First, the work focused on examining of the influence of annealing on the throughput in the whole measuring range, and then comparing the series due to the transmittance in the visible light spectrum. Furthermore were compared the value of sheet resistance of unannealed and subsequently annealed samples.
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Creating themes thin-film methods
Ondráček, Michal ; Šimonová, Lucie (referee) ; Šubarda, Jiří (advisor)
The master’s thesis deals with the theory of thin film technology, especially creating these layers. The work includes the distribution of vacuum deposition techniques for physical (PVD) and chemical (CVD). The main aim is to create a theme in different ways of implementation by using magnetron sputtering device, and these motives evaluated in terms of the quality of sputtering.
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Deposition of the thin films for applications of advanced oxidation processes using metal dopants
KRAJČOVIČ, Jan
The aim of this diploma thesis is deposition of TiO2 thin films onto different types and sizes of substrates, and some of these layers dope by iron or silver. During the work was range of TiO2 layers created using a method of physical vapor deposition namely magnetron sputtering. For these processes was chosen the Dreva ARC 400 Hard Material Coating Plant device. The main aim of these depositions was to attempt to create TiO2 thin films on a substrates of larger surface than its in average laboratory processes usual. For this purpose were TiO2 layers deposited onto square glass plates of side length 10 cm. For comparsion and analysis were also as a substrates used microscope slides and fragments of silicon wafers. These substrates were used for testing of photocatalytic activity and on surface morphology (SEM). The theoretical part of this thesis aims to a methods of deposition TiO2 layers and their characteristics. In the experimental part is the used coating equipment and parameters of each deposition process described. Further the characteristics and results of individual experiments are described.
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