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Electron lithography in scanning electron microscope
Haviar, Stanislav ; Matolín, Vladimír (advisor) ; Lopour, Filip (referee)
Electron beam lithography in a scanning electron microscope Tescan Miran LMH is described. Detailed parametres of preparation procedure of metal structures with characteristic dimensions below 100 nm were obtained. Additionally, a preparation of square arrays of sub 100-nm metal dots with 1 µm periode is being discussed. The lithography was performend with self-prepared resist layers (thickness < 25 nm), parameters of the spin-coating procedure are listed as well. A construction of a model single-wire sensor is described. The sensor had macroscopic gold contacts with thin (< 200 nm) tin oxide wires in between. The structures were investigated by means of scanning electron microscopy and atomic force microscopy.
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Electron lithography in scanning electron microscope
Haviar, Stanislav ; Lopour, Filip (referee) ; Matolín, Vladimír (advisor)
Electron beam lithography in a scanning electron microscope Tescan Miran LMH is described. Detailed parametres of preparation procedure of metal structures with characteristic dimensions below 100 nm were obtained. Additionally, a preparation of square arrays of sub 100-nm metal dots with 1 µm periode is being discussed. The lithography was performend with self-prepared resist layers (thickness < 25 nm), parameters of the spin-coating procedure are listed as well. A construction of a model single-wire sensor is described. The sensor had macroscopic gold contacts with thin (< 200 nm) tin oxide wires in between. The structures were investigated by means of scanning electron microscopy and atomic force microscopy.
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Ion Beam Thin Film Deposition, Surface and Thin Film Analysis
Šikola, T. ; Spousta, J. ; Zlámal, J. ; Průša, S. ; Lopour, F. ; Kalousek, R. ; Třískala, M. ; Tichopádek, P. ; Krejzlík, T. ; Nebojsa, A. ; Lencová, Bohumila
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