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RF-ICP deposition of tungsten coatings
Zlatník, Rostislav ; Houdková, Šárka (referee) ; Čížek, Jan (advisor)
The main object of this work is the technology of radio frequency controlled inductively coupled plasma, abbreviated RF-ICP. The specific goal of the work was the application of surface layers of tungsten and analysis of the influence of changes in process conditions on the resulting microstructure and chemical composition of deposited coatings. The monitored conditions were torch power, choice of carrier gas, powder feedrate.

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