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In situ XPS characterization of diamond films after AR.sup.+./sup. cluster ion beam sputtering
 Artemenko, Anna ; Babchenko, Oleg ; Kozak, Halyna ; Ukraintsev, Egor ; Ižák, Tibor ; Romanyuk, Olexandr ; Potocký, Štěpán ; Kromka, Alexander
In this work, in situ XPS analysis of chemical composition of H- and O-terminated nano- and microcrystalline diamond (NCD and MCD) films before and after their sputtering by the Ar+ cluster ion beam was investigated. Scanning electron microscopy confirmed sputtering of all diamond surfaces with a rate about 0.5 nm/min. Raman spectroscopy and XPS revealed surface graphitization of diamond surface induced by sputtering. Moreover, XPS data showed the presence of about 0.7 % of Ar atoms on the investigated diamond surface after 66 min of sputtering. Also, oxygen residuals were still presented on the H-NCD surface after 66 min of sputtering. In contrast, no oxygen was found on the H-MCD surface just after 2 min of sputtering. Surface composition is discussed in respect to the diamond films growth parameters and surface structure.
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