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Structure and Properties of Coatings Produced by PVD Technology
Doubrava, Marek ; Horynová, Miroslava (referee) ; Čelko, Ladislav (advisor)
The submitted work is focused on study of 3rd generation DLC films produced by Platit a.s. company. Thin films are deposited utilizing filtered cathodic vacuum arc process (FCVA). The main goal of thesis was to find out the influence on film properties, caused by change of the substrate holders with different heat dissipation. The change of the substrate holders is motivated purely by economical effort to increase productivity of the deposition process. Teoretical part of the thesis is about the principles of PVD deposition process, characterization of the thin films, DLC thin films and materials used for cutting tools. Experimental part includes description of devices used for specimens analyses, including also the description of measuring process and used conditions. Acquiered results, not only the thin film thickness, adhesion or amount of sp^3 bonds, match with expected results.
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Design, production and characterization of the adhesive layer for the deposition of ta-C coating by the magnetron sputtering method
Drásalová, Kateřina ; Juliš, Martin (referee) ; Klakurková, Lenka (advisor)
The topic of this thesis is improving the adhesion parameters of the DLC (diamond-like carbon) coating, specifically for its non-hydrogenated form ta-C (tetra amorphous carbon), for the deposition of ta-C coating by the magnetron sputtering with a central rotating cathode method. A possible solution is the creation of a chrome adhesive layer between this coating and the substrate. Effects of the adhesive layer on the coating are controlled by change settings of a process parameters as temperature, voltage, or time of deposition. The aim of the experiment was the production of such an adhesive layer that will increase the adhesion of the ta-C coating without worsening its other properties. The resulting properties of the deposited coating were analysed using a calotest for thickness measuring, Rockwell test and scanning electron microscopy (SEM) to assess adhesion and cohesion parameters, instrumented penetration tests to determine hardness and bent-strip method to calculate internal stress. By evaluating the prepared samples, depending on the resulting useful properties of the coating, the best deposition parameters were determined.
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Structure and Properties of Coatings Produced by PVD Technology
Doubrava, Marek ; Horynová, Miroslava (referee) ; Čelko, Ladislav (advisor)
The submitted work is focused on study of 3rd generation DLC films produced by Platit a.s. company. Thin films are deposited utilizing filtered cathodic vacuum arc process (FCVA). The main goal of thesis was to find out the influence on film properties, caused by change of the substrate holders with different heat dissipation. The change of the substrate holders is motivated purely by economical effort to increase productivity of the deposition process. Teoretical part of the thesis is about the principles of PVD deposition process, characterization of the thin films, DLC thin films and materials used for cutting tools. Experimental part includes description of devices used for specimens analyses, including also the description of measuring process and used conditions. Acquiered results, not only the thin film thickness, adhesion or amount of sp^3 bonds, match with expected results.
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