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Certified methodology for textile deposition
KUŽELOVÁ, Zdenka ; ŠEVČÍK, Richard ; PŘÍHODA, Jiří ; NASADIL, Petr
The methodology was created for the neeeds of museum workers handling and depositing textile artefacts. The methodology is focused on depositories where textile artefacts are stored. The content is focused on traditional folk clothing from Moravia originating from the period of 1850-1950 and the methodology is specific in this way. It is necessary to emphasize that the folk textile (clothing) was stored in its own way which has to be kept and which some attention should be paid to.
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Deposition of the thin films for applications of advanced oxidation processes using metal dopants
KRAJČOVIČ, Jan
The aim of this diploma thesis is deposition of TiO2 thin films onto different types and sizes of substrates, and some of these layers dope by iron or silver. During the work was range of TiO2 layers created using a method of physical vapor deposition namely magnetron sputtering. For these processes was chosen the Dreva ARC 400 Hard Material Coating Plant device. The main aim of these depositions was to attempt to create TiO2 thin films on a substrates of larger surface than its in average laboratory processes usual. For this purpose were TiO2 layers deposited onto square glass plates of side length 10 cm. For comparsion and analysis were also as a substrates used microscope slides and fragments of silicon wafers. These substrates were used for testing of photocatalytic activity and on surface morphology (SEM). The theoretical part of this thesis aims to a methods of deposition TiO2 layers and their characteristics. In the experimental part is the used coating equipment and parameters of each deposition process described. Further the characteristics and results of individual experiments are described.
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Deposition methods of thin films using low-temperature plasma
GÜNZEL, Martin
This thesis is focused on the description of selected deposition methods of thin films using low-temperature plasma. Currently, many various technologies of thin films are developed and there are many applications in various industrial sectors. This thesis first gives a brief overview of deposition methods, plasma behavior during deposition and subsequent description of the selected methods of application due to the physical and chemical processes. They also discussed the advantages and disadvantages of the described coating technologies, and several examples of their use. The thesis should thus contribute to the overall view of modern coating technologies, their development and use currently, or possible use in the future.
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Deposition of Aerosol Particles on Filter Surfaces
Smolík, Jiří ; Mašková, Ludmila ; Zíková, Naděžda ; Ondráček, Jakub
The simple model showed that the particle penetration and deposition depend on particle size and width of the gap, with the depth of the penetration limited by parallel diffusional deposition on filter surfaces. Smaller particles penetrate faster and deeper resulting in higher particle number concentration of deposited particles but higher mass is transported by larger particles. The results of modelling have been qualitatively confirmed by Ion Chromatography using sulphate as marker for deposited particles.
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The Seal of Lantescien in the Context of Criminal Law
KOMÁROVÁ, Vendula
The thesis provides a concise explanation of the notions of confession and the seal of confession and observance of the same by Czech Republic criminal law. The seal of confession is especially provided for by Act No. 3/2002 Coll. on churches and religious societies. In my thesis, I also address the issue of protecting other types of non-disclosure recognized by the Czech Republic. The main topic covers respecting the seal of confession in the context of criminal law. I particularly concentrate on respecting the seal of confession in relation to Sections 167 and 168 of the Criminal Code concerning failure to prevent an offence and failure to report an offence. I also take note of the duty to testify and exceptions to the same. Whereas one of the exceptions{--}prohibition of interrogation{--}does indicate protection of the seal of confession, the other{--}the right to refuse testimony{--}includes no such unequivocal protection. Generally, Czech laws do recognize the seal of confession, and it is impossible to punish observance by priests of the seal of confession.
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PIC simulace pravoúhlých a seříznutých štěrbin ve zkušebním limiteru tokamaku TEXTOR
Komm, M. ; Pekarek, Z. ; Pánek, Radomír ; Matveev, D. ; Kirschner, A. ; Litnovsky, A.
In this paper, we present results of Particle-In-Cell simulations of the plasma behavior in the vicinity of gaps in castellated plasma-facing components. We studied gaps in the test limiter of TEXTOR, which is a plasma-facing component designed for studies of impurity transport and fuel retention, mainly via hydrocarbon layer formation. The castellated limiter tiles have been analyzed using the postmortem techniques and first attempts of impurity transport modelling were done using the 3DGAP code [Matveev et al., 2008]. In order to improve the agreement between modeling and experiment, realistic plasma particle flux distribution needs to be included in the code. For this purpose, a series of PIC simulations for varying plasma conditions was performed by using the SPICE2 code [Dejarnac et al., 2008]. Plasma behavior inside the gaps is discussed and semi-empiric characterization via generic fitting procedure is proposed
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Experimentální studie depozice aerosolů v testovací komoře.
Hruška, A. ; Dohányosová, Pavla ; Hemerka, J. ; Smolík, Jiří
Particle-phase contaminants in the indoor environment can cause adverse health effects on the general public. It is therefore important to understand the particle behavior. One of the most important processes, which affect the indoor aerosol concentration, is a particle deposition on walls and other inner surfaces. The properties of the aerosol deposition is a main subject of a GACR project conducted in collaboration between the Czech Technical University and The Laboratory of Aerosol Chemistry and Physics of the Institute of Chemical Processes Fundamentals AS CR.
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