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	Preparation of Stuctured Thin Layers of Titanium Dioxide Lukešová, Magdalena ; Jančovičová, Viera (referee) ; Veselý, Michal (advisor) Cílem práce bylo seznámit se s dostupnými zdroji popisujícími zkoumanou tématiku tenkých vrstev oxidu titaničitého. Na připravených tenkých filmech byla studována fotokatalytická aktivita a indukované hydrofilní vlastnosti. Transparentní filmy oxidu titaničitého byly připraveny na sodnovápenatém skle metodou sol-gel. Na přípravu TiO2 solu byl použit tetraisopropoxid titaničitý (TTIP) jako prekurzor. Přidaný polyethylen glykol (PEG) sloužil jako strukturu-řídící složka, acetyl aceton zase ovlivňoval hydrolyzační a kondenzační reakce. Pro nanášení solu na skleněné destičky byla použita technika mikropiezo depozice. Na získaných filmech byla studována fotokatalytická aktivita prostřednictvím degradace 2,6-dichlorindofenolu (DCIP). Rychlost odbourávání DCIP byla vyjádřena pomocí formální rychlostní konstanty reakce prvního řádu. Měřením kontaktního úhlu byla zkoumána smáčecí schopnost vrstev. Filmy, které byly vystaveny ultrafialovému záření, se chovaly superhydrofilně. Detailed record
	Deposition of the thin films for applications of advanced oxidation processes using metal dopants KRAJČOVIČ, Jan The aim of this diploma thesis is deposition of TiO2 thin films onto different types and sizes of substrates, and some of these layers dope by iron or silver. During the work was range of TiO2 layers created using a method of physical vapor deposition namely magnetron sputtering. For these processes was chosen the Dreva ARC 400 Hard Material Coating Plant device. The main aim of these depositions was to attempt to create TiO2 thin films on a substrates of larger surface than its in average laboratory processes usual. For this purpose were TiO2 layers deposited onto square glass plates of side length 10 cm. For comparsion and analysis were also as a substrates used microscope slides and fragments of silicon wafers. These substrates were used for testing of photocatalytic activity and on surface morphology (SEM). The theoretical part of this thesis aims to a methods of deposition TiO2 layers and their characteristics. In the experimental part is the used coating equipment and parameters of each deposition process described. Further the characteristics and results of individual experiments are described. Detailed record
	Optimization of deposition parameters in order to create a photocatalytic titanium oxide films produced by PECVD PEKÁREK, Michal This thesis presents Photocatalytic TiOx layers created by own PECVD reactor assembled in the building of Department of Applied Physics and Technics. Parameters of depositions were optimalized as well as the PECVD reactor itself. Final layers are compared to layers made by Degussa P25. As a result based on the included measurements, this thesis tries to answer the question whether PECVD is the suitable method for depositions of photocatalytic layers. Detailed record

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