Příprava heterogenních nanostrukturovaných vrstev kov/kov

Pivko, Pavol

Nanostructured metal layers are widely used in microelectronics, catalysis, and sen- sors, where their properties depend on their structure and chemical composition. Precise control of the growth and composition of these layers is therefore crucial for their prac- tical applications. This work focuses on the preparation of Al/Cu-type nanostructured thin films and the study of their morphology and chemical composition. The layers were prepared by magnetron sputtering and using a gas aggregation source of Cu nanoparticles at different deposition sequences. Scanning electron microscopy (SEM), energy disper- sive spectroscopy (EDS), X-ray photoelectron spectroscopy (XPS) and X-ray diffraction (XRD) were used to characterize them. The applicability of XPS to determine the Al/Cu ratio on the surface was investigated, and the effect of cross-contamination between mag- netrons was evaluated. A method for preparing multilayers from a defined sequence of Al and Cu monolayers was optimized. Furthermore, the effect of magnetron current on the deposition rate and nanoparticle size was investigated. Finally, the nanoparticle layers were heated to different temperatures, and the change of their structure, especial- ly the distribution of chemical elements, size, shape, and position of nanoparticles, was observed.

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