Original title: Patterning of conductive nano-layers on garnet
Authors: Chlumská, Jana ; Lalinský, Ondřej ; Matějka, Milan ; Krátký, Stanislav ; Kolařík, Vladimír
Document type: Papers
Conference/Event: International Conference NANOCON 2020 /12./, Brno (CZ), 20201021
Year: 2021
Language: eng
Abstract: Synthetic crystalline materials of the garnet group are used as scintillators in scanning electron microscopy. If a thick conductive layer is applied on the garnet surface, slower electrons don't have enough energy to pass through this relatively thick conductive layer on the scintillator surface. Therefore, either thinner conductive layer or appropriate patterning of the thicker layer has to be used. Within this contribution we study the patterning process of such conductive nano-layer. Resolution of the patterning process is of high interest. Two approaches are compared: direct writing electron beam lithography and mask projection UV lithography.
Keywords: Electron beam lithography; nano-patterning; yttrium aluminium garnet
Project no.: TN01000008
Funding provider: GA TA ČR
Host item entry: NANOCON 2020. 12th International Conference on Nanomaterials - Research & Application. Conference proceedings, ISBN 978-80-87294-98-7, ISSN 2694-930X
Note: Související webová stránka: https://www.confer.cz/nanocon/2020/3731-patterning-of-conductive-nano-layer-on-garnet

Institution: Institute of Scientific Instruments AS ČR (web)
Document availability information: Fulltext is available at the institute of the Academy of Sciences.
Original record: http://hdl.handle.net/11104/0320902

Permalink: http://www.nusl.cz/ntk/nusl-447545


The record appears in these collections:
Research > Institutes ASCR > Institute of Scientific Instruments
Conference materials > Papers
 Record created 2021-07-25, last modified 2022-09-29


No fulltext
  • Export as DC, NUŠL, RIS
  • Share