Original title: Optimisation of Reliefs of Thin Polymer Films of Resist for Phase Diffractive Optical Elements
Authors: Matějka, František ; Matějková, Jiřina
Document type: Papers
Conference/Event: EDS 'Y2K /7./ - Electronic Devices and Systems Workshop, Brno (CZ), 2000-09-04 / 2000-09-13
Year: 2000
Language: eng
Abstract: Electron-beam lithography uses polymer electron resists mostly for recording of picture information. The behaviour of these polymer electron resists, under influence of the electron of the given energy, is expressed by the sensitivity curve. The curve of sensitivity is constructed as dependence of the relative change of thickness of the functional layer of resist, on the density of the absorbed energy.
Keywords: electron-beam lithography
Project no.: CEZ:AV0Z2065902 (CEP), IBS2065014 (CEP)
Funding provider: GA AV ČR
Host item entry: Proceedings - Electronic Devices and Systems Y2K - Intensive Training Programme in Electronic System Design - Workshop, ISBN 80-214-1780-3
Note: Související webová stránka: mailto:matejka@isibrno.cz

Institution: Institute of Scientific Instruments AS ČR (web)
Document availability information: Fulltext is available at the institute of the Academy of Sciences.
Original record: http://hdl.handle.net/11104/0101034

Permalink: http://www.nusl.cz/ntk/nusl-29514


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Research > Institutes ASCR > Institute of Scientific Instruments
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