Original title: Optimization of reliefs of thin polymer films of resist for phase diffractive optical elements
Authors: Matějka, František ; Matějková, Jiřina
Document type: Papers
Conference/Event: New Trends in Surface nad Thin Film Physics and Engineering - International Summer School, Tři Studně (CZ), 1999-06-14 / 1999-06-18
Year: 1999
Language: eng
Abstract: Electron beam lithography uses polymer electron resists mostly for recording of picture information. The behaviour of these polymer electron resists, under influence of the electron of the given energy, is expressed by the sensitivity curve. The curve of sensitivity is constructed as dependence of the relative change of thickness of the functional layer of resist, on the density of the absorbed energy.
Project no.: CEZ:AV0Z2065902 (CEP)
Host item entry: New Trends in Surface nad Thin Film Physics and Engineering - International Summer School
Note: Související webová stránka: mailto:iv@isibrno.cz

Institution: Institute of Scientific Instruments AS ČR (web)
Document availability information: Fulltext is available at the institute of the Academy of Sciences.
Original record: http://hdl.handle.net/11104/0100929

Permalink: http://www.nusl.cz/ntk/nusl-29492


The record appears in these collections:
Research > Institutes ASCR > Institute of Scientific Instruments
Conference materials > Papers