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Stability of an optical monitor for deposition of 42-layer interference bandpass filter 520-590 nm
Žídek, Karel
We report on stability of a deposition process of a complex system of thin layers. The layers were designed as a 42-layer bandpass interference filter. The layers of TiO2 and SiO2 were monitored both by the means of a crystal and an optical thickness monitor. We discuss the case when the design of the interference filter is continuously adapted according to the real thickness of the already deposited layers.

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