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Growth of diamond thin films: a review
Kromka, Alexander ; Potocký, Štěpán ; Rezek, Bohuslav
Diamond is shown as an extraordinary material which offers promising solution for variety of fundamental studies and industrial uses. Here, growth of synthetic diamond films at low pressures (1 atm) and low temperatures (<1000°C) from carbon consisting gas mixtures is discussed. Variety of chemical vapor deposition techniques are reviewed, their advantages and disadvantages are pointed out too.
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Study of nucleation and growth of diamond thin films
Ižák, Tibor ; Babchenko, Oleg ; Varga, Marián ; Potocký, Štěpán ; Marton, M. ; Vojs, M. ; Domonkos, Mária ; Kromka, Alexander
This study deals with the nucleation and growth of CVD diamond films on Si substrates. In nucleation part two different nucleation methods were studied: (i) the bias enhanced nucleation (BEN) and (ii) ultrasonic seeding. In the case of BEN, (i) the nucleation time and (ii) the influence of bias voltage were studied. For ultrasonic seeding the effect of different solutions of ultradisperzed detonation nanodiamond (UDD) powder with metal particles on the nucleation efficiency and growth process was investigated (i.e. diamond powder, nanosized Ni, microsized Co and Y metal powders).
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Review of nanocrystalline diamond film deposition on silicon and glass substrates down to 400 °C
Potocký, Štěpán ; Babchenko, Oleg ; Ižák, Tibor ; Varga, Marián ; Kromka, Alexander ; Rezek, Bohuslav ; Michalka, M.
We present an overview of a nanocrystalline diamond (NCD) films deposition on silicon and glass substrates by microwave plasma CVD in hydrogen-based gas mixture. The temperature plays a crucial parameter as the diamond growth process is temperature controlled. Use of temperature sensitive substrates demanded reducing substrate temperature. Natural decrease of deposition rate resulted in search of new or nonstandard process parameters which could at least minimize or compensate it. Addition of oxygen containing gasses was found to improve film quality, and increasing deposition speed. Moreover improvement in pre-treatment of foreign substrates allowed deposition of fully closed films in less then 100 nm. Low thickness of NCD always favorable due to lattice mismatch between substrate material and NCD film. Successful adoption of NCD film deposition on silicon and glass allowed us to study surface chemical modification for protein attachment and DNA immobilization.
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Pulsed linear antenna microwave plasma – a step ahead in large area material depositions and surface functionalization
Kromka, Alexander ; Babchenko, Oleg ; Ižák, Tibor ; Potocký, Štěpán ; Davydova, Marina ; Neykova, Neda ; Kozak, Halyna ; Remeš, Zdeněk ; Hruška, Karel ; Rezek, Bohuslav
A technological progress in the large area growth of diamond films and carbon nanotubes by the modified linear antenna MW system is presented. We show a correlation between process parameters and nano- or poly-crystalline film character. A challenging part, diamond coated mirrors or ATR prisms, are shown as multifunctional optical elements suitable for detection of absorbed molecules. Additional positive feature of the presented plasma system is low temperature hydrogen functionalization of diamond films. Finally, we present that combination of pulsed MW plasma with radiofrequency substrate biasing results in growth of oriented CNTs over large area.
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