National Repository of Grey Literature 111 records found  1 - 10nextend  jump to record: Search took 0.00 seconds. 
SMV-2023-01: Relief structures based on diffractive optics
Horáček, Miroslav ; Kolařík, Vladimír ; Matějka, Milan ; Krátký, Stanislav ; Chlumská, Jana ; Meluzín, Petr ; Král, Stanislav
Research and development in the field of physical realization of graphic and optical structures based on the principle of diffractive optics by means of electron beam lithography in a recording material supported by a silicon or glass board. The research covers the analysis of the graphical or optical motive, research and application of relief structures implementing the required graphic and optical properties, research and modeling of the physical possibilities of implementation of relief structures, preparation and analysis of technology of implementation of relief structures with regard to the limits of current scientific instruments, verification of theoretical considerations by means of relief structure sample exposure.
SMV-2023-02: Relief optical elements for shaping light bundles
Horáček, Miroslav ; Kolařík, Vladimír ; Matějka, Milan ; Krátký, Stanislav ; Chlumská, Jana ; Meluzín, Petr ; Král, Stanislav
Research and development in the field of relief optical elements for shaping light bundles, metrology of samples of relief optical elements using various microscopic techniques with regard to analysis of relief degradation in production processes, consulting in the field of lithographic processes focusing on electron beam and subsequent replication processes. Design and optimization of microoptic structures for various configurations of projector lighting systems, metrology of selected optical microstructured reliefs and optical function analysis, optimization of materials for replication of microoptical structures, consulting in the field of replication of deep microoptic elements for various optical surfaces.
SMV-2023-06: Development of test specimens for SEM
Matějka, Milan ; Krátký, Stanislav ; Meluzín, Petr ; Košelová, Zuzana ; Chlumská, Jana ; Horáček, Miroslav ; Kolařík, Vladimír ; Knápek, Alexandr
The study focuses on the research and development of precise calibration samples featuring relief structures. These samples are designed for calibrating parameters in scanning electron microscopes (SEM). The testing patterns enable the verification and calibration of magnification, orthogonality, and geometric distortion. The preparation of calibration specimens utilizes micro lithographic techniques tailored for silicon processing and other relevant technological procedures.
SMV-2023-05: DI2023
Matějka, Milan ; Krátký, Stanislav ; Meluzín, Petr ; Košelová, Zuzana ; Chlumská, Jana ; Horáček, Miroslav ; Kolařík, Vladimír ; Knápek, Alexandr
The research focuses on the investigation and development of precise calibration samples with relief structures. These samples are designed for calibrating parameters in scanning electron microscopes (SEM). Test patterns allow verification of the imaging quality through microscopic techniques such as overall magnification, field of view size, resolution, deformation in lateral axes, and other geometric distortions. Precision lithographic techniques and other methods derived from silicon processing technologies in the semiconductor industry are employed for sample preparation. The development has been directed towards optimizing the recording of etching masks before transferring the image onto a monocrystalline silicon substrate.
SMV-2022-57: Development of test specimens for SEM
Matějka, Milan ; Horáček, Miroslav ; Meluzín, Petr ; Chlumská, Jana ; Král, Stanislav ; Kolařík, Vladimír ; Krátký, Stanislav
Research and development of accurate calibration samples with relief structures. The samples are intended for parameter calibration of scanning electron microscope (REM). Testing patterns allow to check and calibrate magnification, orthogonality and geometric distortion. Micro lithographic techniques for silicon processing and other related technological processes have been developed for the calibration specimen preparation.
SMV-2022-01: Relief structures based on diffractive optics
Horáček, Miroslav ; Kolařík, Vladimír ; Matějka, Milan ; Krátký, Stanislav ; Chlumská, Jana ; Meluzín, Petr ; Král, Stanislav
Research and development in the field of physical realization of graphic and optical structures based on the principle of diffractive optics by means of electron beam lithography in a recording material supported by a silicon or glass board. The research covers the analysis of the graphical or optical motive, research and application of relief structures implementing the required graphic and optical properties, research and modeling of the physical possibilities of implementation of relief structures, preparation and analysis of technology of implementation of relief structures with regard to the limits of current scientific instruments, verification of theoretical considerations by means of relief structure sample exposure.
A sampler of diffraction and refraction optically variable image elements
Horáček, Miroslav ; Krátký, Stanislav ; Matějka, Milan ; Chlumská, Jana ; Meluzín, Petr ; Pirunčík, J. ; Aubrecht, I. ; Kotrlý, M. ; Kolařík, Vladimír
Diffraction and refraction optically variable image elements are basic building blocks of planar structures for advanced security of documents and valuables. A sampler formed by an array of 36 diffraction structures binary, tertiary, quaternary and blazed gratings (period range 400 nm 20,000 nm) represents a cross-section throughout technological steps mastering, galvanic replication and embossing. Electron-beam writing technology with Gaussian beam and electron energy of 100 keV, with very small forward scattering of high energy electrons and with the possibilities to create a linear grating with the minimal period of 100 nm, was used to create the master. An important advantage of high-resolution electron-beam lithography is its substantial flexibility in combining possible planar structures with significantly different parameters, such as very dense and relatively shallow structures together with deep structures (approx. 10 microns) with precise shapes (micro-lenses or Fresnel structures). For protection of documents and valuables, interesting results are induced with planar optical structures consisting of non-periodic arrangements, which are characterized by high robustness to counterfeiting and imitation. While the origination process is available for grating period down to 100 nm, the mass replication technology appears to be a bottleneck of the entire technological process. Measurement of topology and profiles of the structures by atomic forces microscope and documenting the quality of technological process of the three steps of replication of planar optically variable elements was performed for all 36 structure types of sampler.
SMV-2021-31: TELIGHT aiming pattern
Matějka, Milan ; Horáček, Miroslav ; Chlumská, Jana ; Kolařík, Vladimír ; Krátký, Stanislav
The field of development concerns the realization of precise relief structures using electron lithography and reactive ion etching. Development of technology for the creation of a precise phase filter of the plane-parallel type for optical applications by modification of quartz substrates by means of precise dry etching.
SMV-2021-07: Relief microstructures based on diffractive optics
Horáček, Miroslav ; Kolařík, Vladimír ; Matějka, Milan ; Krátký, Stanislav ; Chlumská, Jana ; Meluzín, Petr ; Král, Stanislav
Research and development in the field of physical realization of graphic and optical structures based on the principle of diffractive optics by means of electron beam lithography in a recording material supported by a silicon or glass board. The research covers the analysis of the graphical or optical motive, research and application of relief structures implementing the required graphic and optical properties, research and modeling of the physical possibilities of implementation of relief structures, preparation and analysis of technology of implementation of relief structures with regard to the limits of current scientific instruments, verification of theoretical considerations by means of relief structure sample exposure.
SMV-2021-01: Relief structures based on diffractive optics
Horáček, Miroslav ; Kolařík, Vladimír ; Matějka, Milan ; Krátký, Stanislav ; Chlumská, Jana ; Meluzín, Petr ; Král, Stanislav
Research and development in the field of physical realization of graphic and optical structures based on the principle of diffractive optics by means of electron beam lithography in a recording material supported by a silicon or glass board. The research covers the analysis of the graphical or optical motive, research and application of relief structures implementing the required graphic and optical properties, research and modeling of the physical possibilities of implementation of relief structures, preparation and analysis of technology of implementation of relief structures with regard to the limits of current scientific instruments, verification of theoretical considerations by means of relief structure sample exposure.

National Repository of Grey Literature : 111 records found   1 - 10nextend  jump to record:
See also: similar author names
14 MATĚJKA, Martin
2 Matějka, M.
1 Matějka, Marcel
1 Matějka, Marek
14 Matějka, Martin
2 Matějka, Michal
30 Matějka, Milan
2 Matějka, Miroslav
1 Matějka, Miroslav Pacifik
Interested in being notified about new results for this query?
Subscribe to the RSS feed.