|
|
Bandpass filter for secondary electrons in SEM - simulations
Konvalina, Ivo ; Mika, Filip ; Krátký, Stanislav ; Müllerová, Ilona
Scanning electron microscope (SEM) is commonly equipped with a through-the-lens secondary electron detector (TLD). The TLD detector in Magellan 400 FEG SEM works as a bandpass filter for the special setup of potentials of electrodes inside the objective lens, the positive potential on the specimen regulates the energy window of the filter. An energy filtered image contains additional information to that of an unfiltered one. The contrast of the filtered image is changed and new information about the topography and the material can be observed.\nTo understand image contrast formation with TLD detector we traced SEs and BSEs through the three-dimensional (3D) model of included 3D distribution of the electrostatic and magnetic fields. The properties of the bandpass filter were simulated for a working distance (WD) in the range of 1 mm to 3 mm and a primary beam energy (EP) from 1 keV to 10 keV.\nThe 3D electrostatic field of the system was calculated by Simion, magnetic field and raytracing were done using EOD program.
|
|
|
Large-area gray-scale structures in e-beam writer versus area current homogeneity and deflection uniformity
Kolařík, Vladimír ; Horáček, Miroslav ; Matějka, Milan ; Krátký, Stanislav ; Bok, Jan
The high stability and good current homogeneity in the spot of the e-beam writer is crucial to the exposure quality, particularly in the case of large-area structures when gray-scale lithography is used. Even though the deflection field distortion is calibrated regularly and beam focus and beam astigmatism is dynamically corrected over the entire deflection field,\nwe can observe disturbances in the exposed relief for both nowadays types of e-beam writers, the shaped e-beam writing system and the Gaussian e-beam writing system. A stable and homogeneous angular current density distribution in the spot is important especially in the case of shaped e-beam lithography systems. A non-homogeneity of the spot over deflection field is seen alongside the field boundaries of both lithography systems.
|
|
|
The contrast curves determination for e-beam writer with Gaussian beam
Šuľan, Dušan ; Horáček,, Miroslav (referee) ; Krátký, Stanislav (advisor)
This work deals with technological process of structures creating by using of electron beam lithography. The main focus of the work is contrast curves of PMMA resist determination for electron beam lithography system Vistec EBPG 5000+ ES. Contrast curves are determined for different developers, developing times and the depths of resist. Sensitivity and the contrast of resist are determined from these contrast curves for each resist-developer system. Sensitivity curves are applied to the proximity effect correction on real structures, specifically the periodic diffraction gratings and then they are evaluated.
|
|
|
Plasmonic structures fabricated by e-beam lithography
Šimík, Marcel ; Urbánek,, Michal (referee) ; Krátký, Stanislav (advisor)
The presented study deals with the process of the formation of plasmonic structures using electron beam lithography. The main aim of this work is to create a structure published in NatureNanotechnology using PMMA resist. It has been created several variants of these structures with different exposure doses and shapes in order to determine the best option. From these variants it is concluded which one is the most effective by using optical and electron microscopy. With this information are created and evaluated large-scale exposure.
|
|
|
Properties study of periodic gratings prepared by electron-beam lithography
Krátký, Stanislav ; Opletal, Petr (referee) ; Matějka, Milan (advisor)
This study examines the process of the relief periodic structures creation by way of electron beam lithography. It describes how to design these structures by means of a computer and subsequently how to create them by electron beam lithograph. Moreover, this study explores the methods by which these structures are measured and evaluated. These methods are used to measure and evaulate binary periodic gratings and thanks to obtained data it can be determined the dependence of the depth of grating on its period. The study also contains measurement of diffraction efficiency on manufactured gratings and comparison of the dependence of its diffraction efficiency on the depth of grating.
|
|
|
The silicon etching technology
Krátký, Stanislav ; Ježek,, Jan (referee) ; Matějka, Milan (advisor)
This thesis deals with the silicon etching technology. It Examines using of water solution of potassium hydroxide. It focuses on plasma etching of silicon using mixture of CF4 and O2 as the dry way of etching. Important parameters of etching like etching rate of silicon and masking materials, etching selectivity, surface roughness and underetching of mask are determined for both ways. Some additional processes has been examined as well, namely creating of mask of resist and silicon dioxide, lithography process and etching of resist using oxygen plasma.
|
|
| |
|
|
SMV-2015-15: Development of combined amplitude/phase photo masks
Horáček, Miroslav ; Kolařík, Vladimír ; Matějka, Milan ; Krátký, Stanislav ; Chlumská, Jana ; Meluzín, Petr ; Král, Stanislav
Research and development in the field of physical realization of transparent and opaque optical structures by means of electron beam lithography in a recording material supported by a glass substrate. The research covers the analysis of the graphical motive, its topology and morphology, research and application of binary and relief structures performing required graphical and optical properties, development of technology for the preparation of combined photo masks that process both the amplitude and the phase of the light beam, verification of optical properties of such masks.
|
|
|
SMV-2015-14: Development of e-beam lithography technology
Horáček, Miroslav ; Kolařík, Vladimír ; Matějka, Milan ; Krátký, Stanislav ; Chlumská, Jana ; Meluzín, Petr ; Král, Stanislav
Development of the devices for electron beam lithography technology. Research and development cover the complete lithography system, in particular Schottky Zro/W electron emitter, electron optical column including beam forming system, X-Y stage, high vacuum system, control system electronics.
|
|
|
SMV-2015-13: Relief structures based on diffractive optics
Krátký, Stanislav ; Kolařík, Vladimír ; Horáček, Miroslav ; Matějka, Milan ; Chlumská, Jana ; Meluzín, Petr ; Král, Stanislav
Research and development in the field of physical realization of optical structures based on the principle of diffractive optics by means of electron beam lithography in a recording material supported by a silicon or glass board. The research covers the analysis of the optical motive, research and application of relief structures implementing the required optical properties, research and modeling of the physical possibilities of implementation of relief structures, preparation and analysis of technology of implementation of relief structures with regard to the limits of current scientific instruments, verification of theoretical considerations by means of relief structure sample exposure.
|
guest ::
RSS feed.