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Gas Microsensors Based on Self-Organized 3D Metal-Oxide Nanofilms
Pytlíček, Zdeněk ; Husák, Miroslav (referee) ; Kolařík, Vladimír (referee) ; Prášek, Jan (advisor)
This dissertation concerns the development, fabrication and integration in a gas sensing microdevice of a novel 3-dimensional (3D) nanostructured metal-oxide semiconducting film that effectively merges the benefits of inorganic nanomaterials with the simplicity offered by non-lithographic electrochemistry-based preparation techniques. The film is synthesized via the porous-anodic-alumina-assisted anodizing of an Al/Nb metal bilayer sputter-deposited on a SiO2/Si substrate and is basically composed of a 200 nm thick NbO2 layer holding an array of upright-standing spatially separated Nb2O5 nanocolumns, being 50 nm wide, up to 900 nm long and of 8109 cm2 population density. The nanocolumns work as semiconducting nano-channels, whose resistivity is greatly impacted by the surface and interface reactions. Either Pt or Au patterned electrodes are prepared on the top of the nanocolumn array using an innovative sensor design realized by means of microfabrication technology or via a direct original point electrodeposition technique, followed by selective dissolution of the alumina overlayer. For gas-sensing tests the film is mounted on a standard TO-8 package using the wire-bonding technique. Electrical characterization of the 3D niobium-oxide nanofilm reveals asymmetric electron transport properties due to a Schottky barrier that forms at the Au/Nb2O5 or Pt/Nb2O5 interface. Effects of the active film morphology, structure and composition on the electrical and gas-sensing performance focusing on sensitivity, selectivity, detection limits and response/recovery rates are explored in experimental detection of hydrogen gas and ammonia. The fast and intensive response to H2 confirms the potential of the 3D niobium-oxide nanofilm as highly appropriate active layer for sensing application. A computer-aided microfluidics simulation of gas diffusion in the 3D nanofilm predicts a possibility to substantially improve the gas-sensing performance through the formation of a perforated top electrode, optimizing the film morphology, altering the crystal structure and by introducing certain innovations in the electrode design. Preliminary experiments show that a 3D nanofilm synthesized from an alternative Al/W metal bilayer is another promising candidate for advanced sensor applications. The techniques and materials employed in this work are advantageous for developing technically simple, cost-effective and environmentally friendly solutions for practical micro- and nanodevices, where the well-defined nano-channels for charge carriers and surface reactions may bring unprecedented benefits.
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Optical response of asymmetric plasmonic structures
Babocký, Jiří ; Kolařík, Vladimír (referee) ; Čechal, Jan (advisor)
This diploma thesis deals with study of resonance modes of plasmonic structures. First part provides an overview of theoretical models, which explain the resonanace modes in plasmonic structures. Next part describes technology of electron beam lithography. First section of experimental part deas with technological processes leading to an improvement of resulting structures made by electron beam lithography that is followed by lift-off process. Last part focuses on a study of reflectance spactra of plasmonic antenas and the identification of resonance modes.
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Optimization of diffractive structures
Chalupa, Petr ; Šandera, Josef (referee) ; Kolařík, Vladimír (advisor)
This work is focused on the possibility of sunlight concentration on silicon dies or silicon stripes. The main aim of this work is the design and realization of the concentration element, or system, which is based on diffractive optics and optimized to achieve possibly high optical efficiency. The theoretical part deals with problems of photovoltaic systems and sunlight concentration. The practical part deals with design of optical microstructures and their realization by e-beam lithography using the electron-beam writer BS600. Microstructures created in the electron resist on silicon substrates or embossed into transparent materials are measured in the laboratory. We evaluated and compared their optical properties, which gives some feedback for further optimizations. Transparent elements are tested with real silicon dies and so overall properties of a prototyped photovoltaic module can be evaluated.
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High Efficiency n-type Monocrystalline Silicon Solar Cells
Mojrová, Barbora ; Kolařík, Vladimír (referee) ; Poruba,, Aleš (referee) ; Boušek, Jaroslav (advisor)
Tato dizertační práce je zaměřena vývoj a ověřování nových postupů přispívajících ke zvýšení účinnosti bifaciálních solárních článků založených na monokrystalickém křemíku n-typové vodivosti. Tato práce přináší nové poznatky o vylepšených výrobních procesech a postupech použitých během výroby článků v ISC Konstanz. V rámci práce byly vyrobeny solární články typu n-PERT (Passivated Emitter Rear Totally diffused) s vysokou účinností, a to pomocí standartních procesů a zařízení používaných běžně při průmyslové výrobě. Zapojení těchto průmyslových postupů a metod umožnilo ověřit možnosti výroby n-typových článků za použití téměř totožného vybavení, jaké je potřeba pro výrobu p-typových článků. Zvýšení účinnosti bylo založeno především na vylepšení jednotlivých procesních kroků. Experimenty popsané v této práci dosvědčují zlepšení procesu difúze bóru, přizpůsobení parametrů pasivační a antireflexní vrstvy nově navrženému emitoru, zlepšení procesu metalizace ve smyslu využití past neobsahujících hliník, testování tisku rozličných motivů spolu s různými sekvencemi výpalu. V rámci práce byla testována možnost zamezení jevu potenciální indukované degradace (Potential Induced Degradation – PID) pomocí vhodného složení ARC a pasivační vrstvy. Vyrobené n-typové solární články dosáhly maximální hodnoty účinnosti 20,9 %.
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Electron Beam Control and Diagnostics for Advanced Technologies
Zobač, Martin ; Kolařík, Vladimír (referee) ; Průša, Stanislav (referee) ; Lencová, Bohumila (advisor)
The thesis deals with problems of control and diagnostics of electron beam technological devices which use electron beam for localised intensive heating of a material. A brief description of the electron beam welder MEBW-60/2 is included; the author has participated on its development and implementation. Main topics are the analysis of deflection system properties and the measurement of current distribution of the beam (so-called beam profiles). Geometrical aberrations, hysteresis, stability and dynamics of a single-stage magnetic x-y deflection system are described. Suitable measurement procedures and correction methods are introduced. Methods of transverse and longitudinal beam profile acquisition is presented using successive sampling of the local current density of the beam by a modified Faraday cup. The data processing and evaluation of characteristic beam parameters are shown. The presented methods were verified by fourteen experiments using the electron beam welder. The methods have proven to be useful in practical evaluation of the device properties.
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SMV-2023-01: Relief structures based on diffractive optics
Horáček, Miroslav ; Kolařík, Vladimír ; Matějka, Milan ; Krátký, Stanislav ; Chlumská, Jana ; Meluzín, Petr ; Král, Stanislav
Research and development in the field of physical realization of graphic and optical structures based on the principle of diffractive optics by means of electron beam lithography in a recording material supported by a silicon or glass board. The research covers the analysis of the graphical or optical motive, research and application of relief structures implementing the required graphic and optical properties, research and modeling of the physical possibilities of implementation of relief structures, preparation and analysis of technology of implementation of relief structures with regard to the limits of current scientific instruments, verification of theoretical considerations by means of relief structure sample exposure.
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SMV-2023-02: Relief optical elements for shaping light bundles
Horáček, Miroslav ; Kolařík, Vladimír ; Matějka, Milan ; Krátký, Stanislav ; Chlumská, Jana ; Meluzín, Petr ; Král, Stanislav
Research and development in the field of relief optical elements for shaping light bundles, metrology of samples of relief optical elements using various microscopic techniques with regard to analysis of relief degradation in production processes, consulting in the field of lithographic processes focusing on electron beam and subsequent replication processes. Design and optimization of microoptic structures for various configurations of projector lighting systems, metrology of selected optical microstructured reliefs and optical function analysis, optimization of materials for replication of microoptical structures, consulting in the field of replication of deep microoptic elements for various optical surfaces.
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SMV-2023-06: Development of test specimens for SEM
Matějka, Milan ; Krátký, Stanislav ; Meluzín, Petr ; Košelová, Zuzana ; Chlumská, Jana ; Horáček, Miroslav ; Kolařík, Vladimír ; Knápek, Alexandr
The study focuses on the research and development of precise calibration samples featuring relief structures. These samples are designed for calibrating parameters in scanning electron microscopes (SEM). The testing patterns enable the verification and calibration of magnification, orthogonality, and geometric distortion. The preparation of calibration specimens utilizes micro lithographic techniques tailored for silicon processing and other relevant technological procedures.
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SMV-2023-05: DI2023
Matějka, Milan ; Krátký, Stanislav ; Meluzín, Petr ; Košelová, Zuzana ; Chlumská, Jana ; Horáček, Miroslav ; Kolařík, Vladimír ; Knápek, Alexandr
The research focuses on the investigation and development of precise calibration samples with relief structures. These samples are designed for calibrating parameters in scanning electron microscopes (SEM). Test patterns allow verification of the imaging quality through microscopic techniques such as overall magnification, field of view size, resolution, deformation in lateral axes, and other geometric distortions. Precision lithographic techniques and other methods derived from silicon processing technologies in the semiconductor industry are employed for sample preparation. The development has been directed towards optimizing the recording of etching masks before transferring the image onto a monocrystalline silicon substrate.
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