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Photolithographic technique for controlled fabrication of metal structures
 Jusková, Petra ; Hegrová, Jitka ; Foret, František
We are describing two strategies for controlled (geometry and dimension) preparation of metal micro-nano structures. Both techniques are based on photolithographic processes with selective pattern transfer. First technique utilizes agarose gel containing photosensitive silver chloride as the photosensitive layer. Silver structures are formed after irradiation of the gel through the photolithographic mask which defines shape of the resulting structures. Second approach utilizes photolithographic process to form particles from vacuum deposited thin metal layer deposited over soluble sacrificial layer.
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