National Repository of Grey Literature 13 records found  previous11 - 13  jump to record: Search took 0.00 seconds. 
Depozice tenkých vrstev Ba.sub.x./sub.Sr.sub.1-x./sub.TiO.sub.3./sub. pomocí dvoutryskového RF plazmatického systému s efektem duté katody
Hubička, Zdeněk ; Virostko, Petr ; Olejníček, Jiří ; Deyneka, Alexander ; Adámek, Petr ; Valvoda, V. ; Jastrabík, Lubomír ; Šícha, Miloš ; Tichý, M.
Low-pressure plasma jet system with two hollow cathodes was used for deposition of BaxSr1-xTiO3 (BSTO) ferroelectric thin films. High density pulse modulated RF hollow cathode discharge was generated in ceramic nozzles made of SrTiO3 and BaTiO3. In the experiment, the composition of BSTO films was controlled by magnitude of average RF power applied on particular plasma jet guns. X-ray diffraction proved that BSTO thin films were polycrystalline with perovskite structure. Time resolved Langmuir probe system and plasma impedance monitor were used for ´in situ´ plasma diagnostics and control of deposition conditions.
Sondové diagnostiky plazmatického tryskového systému s dutou katodou pro depozice tenkých vrstev TiO.sub.x./sub..
Virostko, Petr ; Hubička, Zdeněk ; Kment, Štěpán ; Adámek, Petr ; Jastrabík, Lubomír ; Tichý, M.
Electric probe diagnostics were used to determine plasma parameters of the low pressure low temperature hollow cathode plasma jet system used for TiOx thin films depositions. Lagmuir probe measurements provided electron energy probability function, electron density, and effective electron temperature in the plasma jet for different working conditions. They were compared with measurements of the positive ion current to the negatively biased substrate. The substrate was biased with pulsed DC or RF voltage.
Properties of TIO.sub.x./sub. films deposited at atmosphere pressure
Sedláková, L. ; Hubička, Zdeněk ; Churpita, Olexandr ; Stranyánek, Martin ; Čtvrtlík, Radim ; Špatenka, P.
TiOx films were deposited on silica glass by RF discharge in atmosphere pressure at low substrate temperature. Some properties of the films were studied depending on annealing temperature after deposition. The thickness, nanohardness, crystallinity and speed of photocatalysis degradation were investigated.

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