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Methodology for removing dust particles from the surface of paper, collagen materials and textiles using the TEA CO2 laser.
Mašková, Ludmila ; Jandová, Věra ; Vávrová, P. ; Součková, M. ; Neoralová, J. ; Novotná, D. ; Fajgar, Radek ; Smolík, Jiří ; Křížová, T. ; Kocová, K.
The aim of this methodology was to develop a set of procedures and recommendations for cleaning materials frequently represented in library collections, using which it will be possible to use pulse infrared TEA CO2 laser to remove dust particles from their surface. The basic requirement is to effectively remove surface contamination without damaging the treated material. For this purpose, a threshold irradiation intensity is established at which the ablation of the surface dirt begins and a threshold irradiation intensity at which the degradation of the library materials. The result is an effective and safe alternative to existing cleaning methods. Furthermore, the aim was to compare the results of this type of treatment of library materials with traditional mechanical cleaning procedures and thus analyse the possible potential of the new method.\n\n
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Microplastics and their removal from water using sorbents.
Spáčilová, Markéta ; Dytrych, Pavel ; Koštejn, Martin ; Fajgar, Radek ; Šolcová, Olga
The increased occurrence of contaminants in water sources, whether microplastics or other organic contaminants, is currently an ever-increasing environmental problem. This issue is closely related to the mapping of their occurrence in the aquatic environment, as well as to possible ways to eliminate them. The work first characterized the characterization of prepared microplastic particles of the five most commonly used plastics (polyethylene, polyamide, polytetrafluoroethylene, polyethylene glycol terephthalate and polystyrene) using scanning electron microscopy (SEM), Raman spectroscopy and infrared spectroscopy (IR). These microplastic particles were used to prepare simulated microplastic contaminated waters. A methodology for determining the number of microplast particles contained was developed on these water samples. Furthermore, the method of their removal from samples with simulated contamination using functional sorbents was tested. Sorbents based on natural bentonites and zeolites were mainly used. It has been confirmed that the effectiveness of these materials depends not only on their composition and textural properties, but can also be increased by modifying them.\n
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Methodology of removing dust particles from the surface of paper, collagen materials and textiles using the TEA CO2 laser
Mašková, Ludmila ; Jandová, Věra ; Vávrová, Petra ; Součková, Magda ; Neoralová, Jitka ; Novotná, Dana ; Fajgar, Radek ; Smolík, Jiří ; Křížová, Tereza ; Kocová, Kateřina
Cílem této metodiky bylo vytvořit soubor postupů a doporučení pro čištění knihovních materiálů, s jejichž využitím bude možné odstranit prachové částice z jejich povrchu pomocí infračerveného TEA CO2 laseru. Základním požadavkem je efektivní odstranění povrchového znečištění bez poškození ošetřovaného materiálu. Výsledkem je účinná a bezpečná alternativa ke stávajícím metodám čištění.
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Microplastics and their removal from water using sorbents.
Spáčilová, Markéta ; Dytrych, Pavel ; Krejčíková, Simona ; Fajgar, Radek ; Šolcová, Olga
The occurrence of contaminants in water sources, microplastics or other organic pollutants, has been an increasing environmental problem. This issue is related to mapping of their occurrence in an aquatic environment and with finding of possible ways regarding their elimination. The prepared microplastic particles of five most-frequently used plastics (polyethylene, polyamide, polytetrafluoroethylene, polyethylene glycol terephthalate and polystyrene) were characterized by the scanning electron microscopy (SEM), the Raman spectroscopy and the infrared spectroscopy (IR). The obtained microplastic particles were used for preparation of simulated water contaminated with microplastics. The prepared simulated samples of water contaminated with microplastics were used for the development of a methodology for determining the number of contained microplast particles. Furthermore, the possibilities of a microplastic removal from simulated samples by sorbents based on natural bentonites and zeolites were tested. It was confirmed that the effectiveness of sorbents depends on their composition and textural properties and could be increased by their modification.
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Characterization of hydrogenated silicon thin films and diode structures with integrated silicon and germanium nanoparticles
Stuchlík, Jiří ; Fajgar, R. ; Remeš, Zdeněk ; Kupčík, Jaroslav ; Stuchlíková, Hana
P-I-N diode structures based on the thin films of amorphous hydrogenated silicon (a-Si:H) deposited by Plasma Enhanced Chemical Vapor Deposition (PECVD) technique were prepared with embedded Si and Ge nanoparticles. The Reactive Laser Ablation (RLA) of germanium target was used to cover the intrinsic a-Si:H layer by Ge NPs under a low pressure of the silane. The RLA was performed using focused excimer ArF laser beam under SiH4 background atmosphere. Reaction between ablated Ge NPs and SiH4 led to formation of Ge NPs covered by thin GeSi:H layer. The deposited NPs were covered and stabilized by a-Si:H layer by PECVD. Those two deposition processes were alternated repeatedly. Volt-ampere characteristics of final diode structures were measured in dark and under illumination as well as their electroluminescence spectra.
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Characterization of hydrogenated silicon thin films and diode structures with integrated germanium nanoparticles
Stuchlík, J. ; Fajgar, R. ; Remeš, Z. ; Kupčík, Jaroslav ; Stuchlíková, H.
P-I-N diode structures based on the thin films of amorphous hydrogenated silicon (a-Si: H) deposited by Plasma Enhanced Chemical Vapor Deposition (PECVD) technique were prepared with embedded Si and Ge nanoparticles. The Reactive Laser Ablation (RLA) of germanium target was used to cover the intrinsic a-Si: H layer by Ge NPs under a low pressure of the silane. The RLA was performed using focused excimer ArF laser beam under SiH4 background atmosphere. Reaction between ablated Ge NPs and SiH4 led to formation of Ge NPs covered by thin GeSi: H layer. The deposited NPs were covered and stabilized by a-Si: H layer by PECVD. Those two deposition processes were alternated repeatedly. Volt-ampere characteristics of final diode structures were measured in dark and under illumination as well as their electroluminescence spectra.
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