National Repository of Grey Literature 17 records found  1 - 10next  jump to record: Search took 0.01 seconds. 
Implementation of new optical thin film protection element
Hubička, Zdeněk ; Čada, Martin ; Olejníček, Jiří ; Kšírová, Petra ; Tvarog, Drahoslav ; Houha, R. ; Matulová, L.
A new optical protection element was developed with a semiconductor thin film with defined electrical and optical properties.\n
Hybrid reactive HiPIMS deposition system for the deposition of functional metal oxide thin films
Hubička, Zdeněk ; Čada, Martin ; Olejníček, Jiří ; Kšírová, Petra ; Tvarog, Drahoslav
The report describes a hybrid reactive HiPIMS deposition system for the deposition of functional metal oxide thin films with defined optical properties.
Application of low temperature plasma jet systems for the deposition of thin films
Hubička, Zdeněk ; Kment, Štěpán ; Olejníček, Jiří ; Čada, Martin ; Straňák, V. ; Klusoň, J. ; Tichý, M. ; Klusoň, Petr
The low pressure DC pulsed or RF pulsed modulated hollow cathode plasma jets worked on the principle of the reactive sputtering of the hollow cathode usually in the gas mixture of Ar + O2 or N2. The DC pulsed power supplier was applied with combination of the RF source for the plasma jets generation. It was clearly demonstrated that properties of TiO2 and TiO2:N films significantly depended on the plasma parameters. First, the produced films were characterized with the aid of a number of methods (AFM, SEM, XRD, Raman spectroscopy, X-ray photoelectron spectroscopy (XPS), UV–vis spectrometry). Further, the films were judged in terms of their specific optical functionality to generate photocurrents upon being illuminated with spectrally well defined narrow light beams. The parameters of the chemically reactive plasma in the jets were determined using the time-resolved Langmuir probe system. The measurement of the ion energy distribution function was performed by means of the RFA.
Plasma preparation of metal and oxide layers on ceramic and plastic substrates.
Olejníček, Jiří
Contract research was focused on preparation and optimization of the plasma deposition process of selected thin metal and semiconducting oxide layers with required optical properties. The goal was to prepare transparent color electrochromic films on thermally sensitive substrates, the layers with high refractive index on the surface of pressed plastic structures and shiny metallic films on the porous ceramic masks.\n
Plasma preparation of thick metal layers for mechanical engraving of blazed diffraction gratings
Olejníček, Jiří
Contract research was focused on preparation and optimization of the deposition process of the selected thick metal layers with a thickness 5 to 10 microns on a polished glass substrates. The emphasis was mainly on the mechanical properties of films: adhesion, porosity, homogeneity, hardness and time stability.
Photo-Electrochemical Properties of Hierarchical Nanocomposite Structure: Carbon Nanofibers/TiO2/ZnO Thin Films
Hubička, Zdeněk ; Kment, Štěpán ; Gregora, Ivan ; Čada, Martin ; Olejníček, Jiří ; Klusoň, Petr ; Petras, D. ; Krýsa, J. ; Jastrabík, Lubomír ; Dytrych, Pavel
In this contribution we report on photoelectrochemical functionality of the multilayers system consisting of CNF's/photoactive anatase TiO2/ conductive ZnO thin films. Recently the thin phthalocyanines films has been prepared and studied individually.

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