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Characterisation of Nanostructure Deposited by PVD and CVD Technology
Fořt, Tomáš ; Boušek, Jaroslav (referee) ; RNDr.Vilma Buršíková, Ph.D. (referee) ; Sobota, Jaroslav (advisor)
The thesis deals with mechanical properties of thin hard wear-resistant coatings. The work presents a method of dynamic testing of thin hard coatings on a newly constructed prototype of impact wear tester. It provides a comparison with standard methods of layer testing and presents new experimental results of dynamic impact wear test of the coatings. Finally, the thesis covers preparation techniques of thin film systems deposited on various substrates and their characterization using optical and electron microscopy.
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Workplace for testing of solar cells using LBIC method
Harašta, Tomáš ; Jandová, Kristýna (referee) ; Fořt, Tomáš (advisor)
Subject this diploma thesis is introduction to solar problems, with folow-up focus on solar elements and reflection about their defects. The next part is dedicated diagnostic method LBIC (Light Beam Induced Current) that help to detect defects of solar elements. The work is concerned with aplication this method in general view, from construction of workplace, throuhg hardware to software. The last part is focused on results processing and analysis.
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Reactive sputtering Al2O3
Dušek, Jan ; Boušek, Jaroslav (referee) ; Fořt, Tomáš (advisor)
Diploma thesis describes technology of pulse reactive magnetron sputtering of Al2O3 coating. Furthermore it deals with design of deposition process and testing new aluminium target. The technological window was determined by tests. As a result, it was possible to create Al2O3 coatings in the widest possible working range. The coatings created by apparatus PLS 160 were tested for optical properties in order to obtain transmittance. Besides the optical tests, the evaluation of mechanical properties and adhesion were performed. The obtained results from measurement were evaluated. Based on the results, some possible applications of the coating were suggested.
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Thermal stability of Ti/Ni multilayer thin films
Václavík, R. ; Zábranský, L. ; Souček, P. ; Sťahel, P. ; Buršík, Jiří ; Fořt, Tomáš ; Buršíková, V.
In this work, thermal stability and mechanical properties of Ti/Ni multilayer thin films were studied. The multilayer thin films were synthesised by alternately depositing Ti and Ni layers using magnetron sputtering. The thickness of constituent layers of Ti and Ni varied from 1.7 nm to 10 nm, and one coating was deposited by simultaneous sputtering of both targets. Single crystalline silicon was used as a substrate. The effects of thermal treatment on the mechanical properties were studied using nanoindentation and discussed in relation to microstructure evaluated by X-ray diffraction. Annealing was carried out under low-pressure conditions for 2 hours in the range of 100-800 degrees C.
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Study of mechanical properties of nanolayered Ti/Ni coatings
Zábranský, L. ; Václavík, R. ; Přibyl, R. ; Ženíšek, J. ; Souček, P. ; Buršík, Jiří ; Fořt, Tomáš ; Buršíková, V.
The aim of the present work was to study the dependence of mechanical properties of Ti/Ni multilayer thin films on the thicknesses of constituent Ti and Ni layers. The multilayer thin films were synthesized by deposition of Ti and Ni layers alternately on single crystalline silicon substrates using direct current magnetron sputtering method. Thicknesses of Ti and Ni layers varied from 1.7 nm to 100 nm. The micro-structure of the multilayer films was studied using X-ray diffraction technique, scanning electron microscopy with focused ion beam technique and transmission electron microscopy. Mechanical properties obtained from nanoindentation experiments were discussed in relation to microstructural observations.
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SMV-2018-04: Planar microstructures for optical applications
Horáček, Miroslav ; Kolařík, Vladimír ; Matějka, Milan ; Krátký, Stanislav ; Chlumská, Jana ; Meluzín, Petr ; Král, Stanislav ; Fořt, Tomáš ; Oulehla, Jindřich ; Pokorný, Pavel
The development of planar microstructures for optical applications, and subsequent realization of samples by the way of e-beam lithography and other techniques. Project deals with material study suited for the fabrication of planar microstructures in thin metallic layer with respect to achievable resolution and fulfilling the absorbance parameters for particular application. E-beam lithography is used for preparation the motif in resist layer, which is masking layer for the etching of metallic layer by various techniques (wet etching, reactive ion etching). Technical documentation of developed processes and prepared samples are also the part of the project.
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