National Repository of Grey Literature 10 records found  Search took 0.00 seconds. 
CSS3 Style Sheet Analyzer Extensions
Mikulík, Petr ; Bartík, Vladimír (referee) ; Burget, Radek (advisor)
Thesis extends an existing open source CSSBox project by adding support for new CSS3 properties to its jStyleParse parser. Specifically, support for box-shadow, grid layout and finaly CSS animations and transitions was added. Thesis is, just like the original project, writen Java and consists of a series of data structures, implementation methods and testing classes. The result is a git pull request on over the original project repository. All changes related to this thesis are applied to the project and are therefore part of it.
Integration of nanostructures into functional devices
Citterberg, Daniel ; Mikulík, Petr (referee) ; Kolíbal, Miroslav (advisor)
This master thesis is focused on characterization of electrical transport properties of one-dimensional nanostructures. First section of this work deals with theoretical description of the experimental approaches to realization of such measurements. This section involves also a detail discussion of preparation of contacts using e-beam lithography. Next, theoretical description of characterization of nanostructures using photoluminescence measurements is given. Second section describes practical application of the aforementioned electrical transport measurements. Presented results include transport and photoluminescence measurements of WS2 nanotubes, InAs and WO2.72 nanowires. The last section of this thesis deals with nanowire quantum well heterostructures. The section provides both a deeper theoretical view of the problem and results of the photoluminescence measurements are shown.
Rudolfová, Zdena ; Mikulík, Petr (referee) ; Horová, Ivana (referee) ; Kolíbal, Miroslav (advisor)
This thesis deals with the study of GaAs surface properties and with methodology of metal (mainly gold) nanoparticles deposition on GaAs substrate. GaAs has complicated surface oxides structure, which are very reactive when exposed to various chemicals (both acids and alkalines) and therefore they change GaAs surface properties. That is why the study of this properties is crucial for understanding of GaAs surface reactions on metal particles colloidal solution, from which the nanoparticles are deposited on the surface. The possibilites of GaAs surface etching and passivation are discussed. These should lead to surface stability enhancement during colloidal nanoparticles deposition. There was also studied the influence of adhesive polymer monolayer grown on GaAs substrate to the amount of nanoparticles deposited to the surface after substrate immersion into colloidal solution. This thesis concentrates on analyzing of methods, how the gold colloidal nanoparticles can be deposited selectivelly, only to defined areas. The areas were defined using charged particle beam.
Study of the structure of ferromagnetic semiconductors by x-ray scattering methods
Horák, Lukáš ; Holý, Václav (advisor) ; Mikulík, Petr (referee) ; Stangl, Julian (referee)
We studied epitaxial layers of Gallium Manganese Arsenide by various x-ray scattering methods. Since the positions of the Mn dopant in the a host GaAs lattice are crucial for magnetic properties of this material, we focused mainly on a development of the laboratory diffraction method capable to identify Mn in particular crystallographic positions. From the measured diffracted intensity distributed along Crystal Truncation Rods, it is possible deduce the density of Mn interstitials in two non-equivalent crystallographic positions. It is possible to decrease the interstitial Mn density by annealing. We demonstrated our method on severally annealed epitaxial layer. The depth profile of interstitial density was determined after each annealing. The annealing process was simulated by the solving of the Drift- Diffusion equations. From the comparison with the experimentally determined interstitial densities, we estimated the diffusivity of Mn interstitials in the GaAs lattice. Powered by TCPDF (
Assemblage and testing of the device for water ozonizing and its application for silicon wafer cleaning
Ředina, Dalibor ; Mikulík, Petr (referee) ; Voborný, Stanislav (advisor)
Deionised-ozonated water, so-called DIO3 appears to be an ideal alternative for usage in semiconductor industry. The utilisation of DIO3 for removal of photoresist from silicon wafers is faster, cheaper, and more environmental-friendly compared to classical technology based on mixture of sulphuric acid with hydrogen peroxide, so-called SPM. The diploma thesis deals firstly with research into ozone and ozonated water and their possible applications. Next sections describe two prototypes of generators for DIO3, that were assembled in CSVG a.s. Testing of parameters for generators on dissolved-ozone concentration is also a part of this thesis. Moreover, thesis involves tests, that were carrier out in ON Semiconductor in Rožnov pod Radhoštěm. These tests compare efficiency of cleaning by classical technology based on SPM and DIO3 approach.
Semiconductor devices production on silicon
Ježek, Vladimír ; Mikulík, Petr (referee) ; Špinka, Jiří (advisor)
This work deals with the basic technologies and processes of manufacturing semiconductor devices on a silicon substrate. Deals with the processes from creating a layer of silicon dioxide by oxidation, through the creation of structures using photolithography, the doping of additives into defined areas of diffusion, up to creating contacts and conductive pathways by sputtering. It also deals with the technological production process for silicon devices, description of devices and measurement, calculation layers of silicon dioxide, calculated of diffusion and measured characteristics of components and their evaluation.
Application onf the Focused Ion on Electron Beam in Nanotechnologies
Šamořil, Tomáš ; Mikulík, Petr (referee) ; Jiruše, Jaroslav (referee) ; Šikola, Tomáš (advisor)
Nowadays, the systems that allow simultaneous employment of both focused electron and ion beams are very important tools in the field of micro- and nanotechnology. In addition to imaging and analysis, they can be used for lithography, which is applied for preparation of structures with required shapes and dimensions at the micrometer and nanometer scale. The first part of the thesis deals with one lithographic method – focused electron or ion beam induced deposition, for which a suitable adjustment of exposition parameters is searched and quality of deposited metal structures in terms of shape and elemental composition studied. Subsequently, attention is paid also to other types of lithographic methods (electron or ion beam lithography), which are applied in preparation of etching masks for the subsequent selective wet etching of silicon single crystals. In addition to optimization of mentioned techniques, the application of etched silicon surfaces for, e.g., selective growth of metal structures has been studied. The last part of the thesis is focused on functional properties of selected 2D or 3D structures.
Microdefects in Czochralski Silicon
Válek, Lukáš ; Fejfar, Antonín (referee) ; Mikulík, Petr (referee) ; Spousta, Jiří (advisor)
Disertační práce se zabývá studiem defektů v monokrystalech Czochralskiho křemíku legovaných bórem. Práce studuje vznik kruhových obrazců vrstevných chyb pozorovaných na povrchu křemíkových desek po oxidaci. Hlavním cílem práce je objasnit mechanismy vzniku pozorovaného rozložení vrstevných chyb na studovaných deskách a vyvinout metody pro řízení tohoto jevu. Na základě experimentálních analýz a rozborů obecných mechanismů vzniku defektů jsou objasňovány vazby mezi vznikem defektů různého typu. Tyto jsou pak diskutovány v souvislosti s parametry krystalu i procesu jeho růstu. Takto sestavený model je využit pro vývoj procesu růstu krystalů, kterým je potlačen nadměrný vznik defektů ve studovaných deskách. Za účelem studia defektů jsou zaváděny a vyvíjeny nové analytické metody. Disertační práce byla vytvořena za podpory ON Semiconductor Czech Republic, Rožnov pod Radhoštěm.
Characterization of structures fabricated by selective wet etching of silicon
Metelka, Ondřej ; Mikulík, Petr (referee) ; Šamořil, Tomáš (advisor)
The task of master’s thesis was to perform optimalization process for preparing metal etching mask by electron beam litography and subsequent selective wet ething of silicon with crystalographic orientation (100). Further characterization of etched surface and fabricated structures was performed. In particular, attention was given to the morphology demonstrated by scanning electron microscopy and study changes of the optical properties of gold plasmonic antennas due to their undercut.

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1 Mikulík, Petra
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