National Repository of Grey Literature 77 records found  1 - 10nextend  jump to record: Search took 0.01 seconds. 
SMV-2019-75: Relief microstructures based on diffractive optics
Horáček, Miroslav ; Kolařík, Vladimír ; Matějka, Milan ; Krátký, Stanislav ; Chlumská, Jana ; Meluzín, Petr ; Král, Stanislav
Research and development in the field of physical realization of graphic and optical structures based on the principle of diffractive optics by means of electron beam lithography in a recording material supported by a silicon or glass board. The research covers the analysis of the graphical or optical motive, research and application of relief structures implementing the required graphic and optical properties, research and modeling of the physical possibilities of implementation of relief structures, preparation and analysis of technology of implementation of relief structures with regard to the limits of current scientific instruments, verification of theoretical considerations by means of relief structure sample exposure.
SMV-2019-06: Development of test specimens for SEM
Matějka, Milan ; Horáček, Miroslav ; Meluzín, Petr ; Chlumská, Jana ; Král, Stanislav ; Kolařík, Vladimír ; Krátký, Stanislav ; Knápek, Alexandr
Contract research is concerned with the development of precision relief structures in silicon for testing of scanning electron microscopy (REM) imaging. Micro lithographic techniques for silicon processing and other related technological processes have been developed for the calibration specimen preparation.
SMV-2019-01: Relief structures based on diffractive optics
Horáček, Miroslav ; Kolařík, Vladimír ; Matějka, Milan ; Krátký, Stanislav ; Chlumská, Jana ; Meluzín, Petr ; Král, Stanislav
Research and development in the field of physical realization of graphic and optical structures based on the principle of diffractive optics by means of electron beam lithography in a recording material supported by a silicon or glass board. The research covers the analysis of the graphical or optical motive, research and application of relief structures implementing the required graphic and optical properties, research and modeling of the physical possibilities of implementation of relief structures, preparation and analysis of technology of implementation of relief structures with regard to the limits of current scientific instruments, verification of theoretical considerations by means of relief structure sample exposure.
SMV-2019-02: Analysis of planar microstructures prepared by compound writing method
Horáček, Miroslav ; Kolařík, Vladimír ; Matějka, Milan ; Krátký, Stanislav ; Chlumská, Jana ; Meluzín, Petr ; Král, Stanislav
Research and development of materials, techniques and methodology for planar microstructures preparatio. Preparation and evaluation of a thin layers for planar microstructures making, analysis of microstructures using scanning electron microscopy and confocal microscopy, preparation of the masks for compound exposures by means of electron beam lithography, utiilization of UV mask aligner, RIE, etc., verification of the proposed methodology, evaluation of the final parameters.
SMV-2019-05: Phase grids
Krátký, Stanislav ; Matějka, Milan ; Chlumská, Jana ; Horáček, Miroslav ; Kolařík, Vladimír ; Meluzín, Petr ; Král, Stanislav
Development of phased gratings manufacturing for use in transient grating spectroscopy. Possible approaches for phased gratings design were studied during the development to achieve the maximum efficiency for two different wavelengths. Theoretic simulations showed that the grating has to be adjusted for the value of wavelength (the depth of the grating) between two desired values of wavelength to achieve the maximum efficiency in first diffractive orders. The samples were manufactured with use of e-beam lithography and reactive ion etching.
SMV-2019-04: Large-area nanostructures preparing
Horáček, Miroslav ; Kolařík, Vladimír ; Matějka, Milan ; Krátký, Stanislav ; Chlumská, Jana ; Meluzín, Petr ; Král, Stanislav
The development of sandwich nanostructures on doped silicon substrate. The dimension of nanostructures and their pitch is very close to the capability of used e-beam system Raith EBPG5000+. Thin silicon nitride layer was prepared on doped silicon substrate. This layer is needed for wet etching of silicon. The golden markers needed for direct writing of multiple patterns were prepared by the way of e-beam lithography and vacuum evaporation. Mask in the resist layer was exposed for etching of the silicon nitride mask by reactive ion etching in the next step. Wet etching of silicon was carried out after the mask was prepared. Small pyramids were created by the etching process. The last lithography step was preparation of the mask over the pyramids. Thin aluminum layer in the areas where the pyramids are presented was prepared by the way of vacuum evaporation and lift-off technique.
SMV-2019-03: Thin membranes
Krátký, Stanislav ; Matějka, Milan ; Chlumská, Jana ; Horáček, Miroslav ; Kolařík, Vladimír ; Meluzín, Petr ; Král, Stanislav
The development of technology for preparation of very thin silicon nitride membrane for use in low energy electron spectroscopy. Several techniques for preparation of thin membranes were tested during the development – wet etching, reactive ion etching, plasma etching, low-frequency plasma etching. Comparative method for the measurement of such thin membranes was developer also.
Silver micro drop structured twice around the earth
Meluzín, Petr ; Tryhuk, V. ; Horáček, Miroslav ; Knápek, Alexandr ; Krátký, Stanislav ; Matějka, Milan ; Kolařík, Vladimír
Planar micro structuring of thin metallic layers allows to achieve required surface properties of metallic layers covering bulk materials. Recently, the arrangement of micro holes or pillars placed around the primary spiral according to a phyllotactic model was presented. This deterministically aperiodic planar arrangement was used for benchmarking purposes of the e-beam writer patterning. This arrangement based on single primary spiral and a variety of derived secondary spirals has several interesting properties. One of them is a very low ratio between the area populated by individual micro elements and the length of the primary phyllotactic spiral. This paper presents analysis of the phyllotactic spiral length and the rising gradient at the spiral outer edge. The practical part of the presented work deals with the patterning of a thin silver layer deposited on the silicon or glass substrates using e-beam pattern generation, lithography techniques and related technologies. An interesting impact of the mentioned spiral properties on the e-beam writing strategies and the exposure ordering strategy are also discussed.
SMV-2018-05: Development of test specimens for SEM
Matějka, Milan ; Horáček, Miroslav ; Meluzín, Petr ; Chlumská, Jana ; Král, Stanislav ; Kolařík, Vladimír ; Krátký, Stanislav ; Knápek, Alexandr
Development in the field realization of precise relief structures in the silicon dedicated to the testing of the scanning electron microscopes (SEM) deflection field and accuracy. Micro-lithographic techniques for the recording of patterns in the silicon were used. New tools for handling during technological operations of resist deposition and etching were developed. Optimization was reached in the process of transfer of the relief structure into silicon via anisotropic etching, due modification of etching apparatus. Standardized procedures for inspection and quality control were developed.
SMV-2018-04: Planar microstructures for optical applications
Horáček, Miroslav ; Kolařík, Vladimír ; Matějka, Milan ; Krátký, Stanislav ; Chlumská, Jana ; Meluzín, Petr ; Král, Stanislav ; Fořt, Tomáš ; Oulehla, Jindřich ; Pokorný, Pavel
The development of planar microstructures for optical applications, and subsequent realization of samples by the way of e-beam lithography and other techniques. Project deals with material study suited for the fabrication of planar microstructures in thin metallic layer with respect to achievable resolution and fulfilling the absorbance parameters for particular application. E-beam lithography is used for preparation the motif in resist layer, which is masking layer for the etching of metallic layer by various techniques (wet etching, reactive ion etching). Technical documentation of developed processes and prepared samples are also the part of the project.

National Repository of Grey Literature : 77 records found   1 - 10nextend  jump to record:
See also: similar author names
3 Horáček, Marek
6 Horáček, Martin
2 Horáček, Matěj
9 Horáček, Michal
2 Horáček, Miloslav
Interested in being notified about new results for this query?
Subscribe to the RSS feed.