Original title: Photolitography on flexible substrates
Authors: Urbánek, M. ; Urbánek, P. ; Kuřitka, I. ; Kolařík, Vladimír
Document type: Papers
Conference/Event: International Conference on Nanomaterials - Research and Application (NANOCON) /9./, Brno (CZ), 20171018
Year: 2018
Language: eng
Abstract: Nowadays preparation of structures on flexible substrates is highly demanded because of using this patterns in field of flexible electronics. This contribution deals with photolitographic procces for preparation of structures on flexible substrates. The method of photolitography enables to create designed patterns in various material (e.g. metals as conductive layers) on various substrates (silicon wafers, foils, etc.). First the designed pattern is exposed through the mask by UV light into polymer resist, then the pattern is transfered into metal layer by wet etching through the developed windows in resist. In this paper several patterns are prepared through the positive resist PMMA by photolitography into various metal layer (Cu, Al) on flexible substrates.
Keywords: flexible substrates; metal layer; photolithography
Host item entry: 9th International conference on nanomaterrials - research & application (NANOCON 2017). Proceedings, ISBN 978-80-87294-81-9

Institution: Institute of Scientific Instruments AS ČR (web)
Document availability information: Fulltext is available at the institute of the Academy of Sciences.
Original record: http://hdl.handle.net/11104/0292609

Permalink: http://www.nusl.cz/ntk/nusl-391563


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Research > Institutes ASCR > Institute of Scientific Instruments
Conference materials > Papers
 Record created 2019-02-13, last modified 2022-09-29


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