Název:
Thermal desorption spectroscopy in prototype furnace for chemical vapor deposition
Autoři:
Průcha, Lukáš ; Daniel, Benjamin ; Piňos, Jakub ; Mikmeková, Eliška Typ dokumentu: Příspěvky z konference Konference/Akce: Recent Trends in Charged Particle Optics and Surface Physics Instrumentation, Skalský dvůr (CZ), 20180604
Rok:
2018
Jazyk:
eng
Abstrakt: Cleaning of the sample surfaces is crucial for scanning electron microscopy, especially for\nlow energy electron microscopy or for the deposition of thin layers, such as graphene,\nwhere surface has to be well prepared. In the best case, every unwanted particle should be\ncleaned from the sample surface for best low energy electron microscopy observation or thin\nfilm deposition. Unfortunately, the standard cleaning procedures can leave residues on the\nsample surface. This work is focused on thermal desorption spectroscopy (TDS). TDS is a method of observing desorbed molecules from a sample surface during the increase of\ntemperature of the sample. The aim of this study was to determine optimum conditions:\ntemperature and time, to achieve clean surfaces in the shortest time.
Klíčová slova:
CVD; silicon; surface cleaning; thermal desorption spectroscopy Číslo projektu: TE01020118 (CEP), LO1212 (CEP), ED0017/01/01 Poskytovatel projektu: GA TA ČR, GA MŠk, GA MŠk Zdrojový dokument: Recent Trends in Charged Particle Optics and Surface Physics Instrumentation. Proceedings of the 16th International Seminar, ISBN 978-80-87441-23-7
Instituce: Ústav přístrojové techniky AV ČR
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Informace o dostupnosti dokumentu:
Dokument je dostupný v příslušném ústavu Akademie věd ČR. Původní záznam: http://hdl.handle.net/11104/0287627