Original title: Silver catalysed nanoscale silicon etching in water vapour
Authors: Křížek, Filip ; Pikna, Peter ; Fejfar, Antonín
Document type: Papers
Conference/Event: NANOCON International Conference /6./, Brno (CZ), 2014-11-05 / 2014-11-07
Year: 2014
Language: eng
Abstract: N+-doped silicon substrates were etched by water vapour under the silver nanoparticles acting as a catalyst. Thin silver layer was deposited on two silicon wafers, where one of them was thermally annealed in nitrogen to create silver nanoparticles. Subsequently, both samples were annealed in water vapour and afterwards analysed by Scanning Electron Microscope. The images have shown that the annealed silver nanoparticles burrowed into the silicon substrate in the case of both samples. This new method of silicon etching introduces an alternative way of manufacturing nanohole arrays in silicon substrates.\n
Keywords: silicon etching; silver nanoparticles; thermal annealing; water vapour
Project no.: GA13-25747S (CEP), GA13-12386S (CEP), LM2011026 (CEP)
Funding provider: GA ČR, GA ČR, GA MŠk
Host item entry: NANOCON 2014. 6th International conference proceedings, ISBN 978-80-87294-55-0

Institution: Institute of Physics AS ČR (web)
Document availability information: Fulltext is available at the institute of the Academy of Sciences.
Original record: http://hdl.handle.net/11104/0279955

Permalink: http://www.nusl.cz/ntk/nusl-371451


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