Název:
Silver catalysed nanoscale silicon etching in water vapour
Autoři:
Křížek, Filip ; Pikna, Peter ; Fejfar, Antonín Typ dokumentu: Příspěvky z konference Konference/Akce: NANOCON International Conference /6./, Brno (CZ), 2014-11-05 / 2014-11-07
Rok:
2014
Jazyk:
eng
Abstrakt: N+-doped silicon substrates were etched by water vapour under the silver nanoparticles acting as a catalyst. Thin silver layer was deposited on two silicon wafers, where one of them was thermally annealed in nitrogen to create silver nanoparticles. Subsequently, both samples were annealed in water vapour and afterwards analysed by Scanning Electron Microscope. The images have shown that the annealed silver nanoparticles burrowed into the silicon substrate in the case of both samples. This new method of silicon etching introduces an alternative way of manufacturing nanohole arrays in silicon substrates.\n
Klíčová slova:
silicon etching; silver nanoparticles; thermal annealing; water vapour Číslo projektu: GA13-25747S (CEP), GA13-12386S (CEP), LM2011026 (CEP) Poskytovatel projektu: GA ČR, GA ČR, GA MŠk Zdrojový dokument: NANOCON 2014. 6th International conference proceedings, ISBN 978-80-87294-55-0
Instituce: Fyzikální ústav AV ČR
(web)
Informace o dostupnosti dokumentu:
Dokument je dostupný v příslušném ústavu Akademie věd ČR. Původní záznam: http://hdl.handle.net/11104/0279955