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Original title:
Parameter Optimization of Multi-Level Diffraction Gratings
Authors: Matějka, Milan ; Kolařík, Vladimír ; Horáček, Miroslav ; Král, Stanislav
Document type: Papers
Conference/Event: NANOCON 2016. International Conference on Nanomaterials - Research and Application /8./, Brno (CZ), 20161019
Year: 2017
Language: eng
Abstract: Originally, the e-beam lithography (EBL) is a technique for creating high-resolution black and white masks for the optical lithography. Multi-level relief structures can be also prepared using EBL patterning. Their preparation is based on the image patterning with a gradient of exposure doses. Large-area multi-level structures can be effectively prepared using the electron beam pattern generator with a variable shaped beam. We present several writing strategies. Basically, the main writing strategy uses one stamp (i.e. one elementary exposure of the shaped electron beam) per one elementary area with the same exposure dose. This simple approach is fast and flexible, however it does not guarantee optimal results. The main problem is an imperfection of the stamps (size, shape, and homogeneity). Advanced algorithms are based on multiple\nexposure of the same elementary area, the total local exposure dose is a sum of several different elementary exposures (stamps). Using these algorithms, a smoother surface of the structure can be achieved. On the other hand, the writing speed is considerably decreased. Tradeoff between the achieved parameters and the writing speed is discussed for selected set of writing strategy algorithms.
Keywords: e-beam pattern generator; grayscale lithography; multi-level grating; variable shaped beam
Project no.: FR-TI1/576 (CEP), TE01020233 (CEP), LO1212 (CEP), ED0017/01/01
Funding provider: GA MPO, GA TA ČR, GA MŠk, GA MŠk
Host item entry: NANOCON 2016. 8th International Conference on Nanomaterials - Research and Application. Conference Proceedings, ISBN 978-80-87294-71-0
Institution: Institute of Scientific Instruments AS ČR (web)
Document availability information: Fulltext is available at the institute of the Academy of Sciences.
Original record: http://hdl.handle.net/11104/0270769
Permalink: http://www.nusl.cz/ntk/nusl-264738
The record appears in these collections:
Research > Institutes ASCR > Institute of Scientific Instruments
Conference materials > Papers
Authors: Matějka, Milan ; Kolařík, Vladimír ; Horáček, Miroslav ; Král, Stanislav
Document type: Papers
Conference/Event: NANOCON 2016. International Conference on Nanomaterials - Research and Application /8./, Brno (CZ), 20161019
Year: 2017
Language: eng
Abstract: Originally, the e-beam lithography (EBL) is a technique for creating high-resolution black and white masks for the optical lithography. Multi-level relief structures can be also prepared using EBL patterning. Their preparation is based on the image patterning with a gradient of exposure doses. Large-area multi-level structures can be effectively prepared using the electron beam pattern generator with a variable shaped beam. We present several writing strategies. Basically, the main writing strategy uses one stamp (i.e. one elementary exposure of the shaped electron beam) per one elementary area with the same exposure dose. This simple approach is fast and flexible, however it does not guarantee optimal results. The main problem is an imperfection of the stamps (size, shape, and homogeneity). Advanced algorithms are based on multiple\nexposure of the same elementary area, the total local exposure dose is a sum of several different elementary exposures (stamps). Using these algorithms, a smoother surface of the structure can be achieved. On the other hand, the writing speed is considerably decreased. Tradeoff between the achieved parameters and the writing speed is discussed for selected set of writing strategy algorithms.
Keywords: e-beam pattern generator; grayscale lithography; multi-level grating; variable shaped beam
Project no.: FR-TI1/576 (CEP), TE01020233 (CEP), LO1212 (CEP), ED0017/01/01
Funding provider: GA MPO, GA TA ČR, GA MŠk, GA MŠk
Host item entry: NANOCON 2016. 8th International Conference on Nanomaterials - Research and Application. Conference Proceedings, ISBN 978-80-87294-71-0
Institution: Institute of Scientific Instruments AS ČR (web)
Document availability information: Fulltext is available at the institute of the Academy of Sciences.
Original record: http://hdl.handle.net/11104/0270769
Permalink: http://www.nusl.cz/ntk/nusl-264738
The record appears in these collections:
Research > Institutes ASCR > Institute of Scientific Instruments
Conference materials > Papers
Record created 2017-04-04, last modified 2022-09-29