Original title: Large-area gray-scale structures in e-beam writer versus area current homogeneity and deflection uniformity
Authors: Kolařík, Vladimír ; Horáček, Miroslav ; Matějka, Milan ; Krátký, Stanislav ; Bok, Jan
Document type: Papers
Conference/Event: International Seminar on Recent Trends in Charged Particle Optics and Surface Physics Instrumentation /15./, Skalský dvůr (CZ), 20160529
Year: 2016
Language: eng
Abstract: The high stability and good current homogeneity in the spot of the e-beam writer is crucial to the exposure quality, particularly in the case of large-area structures when gray-scale lithography is used. Even though the deflection field distortion is calibrated regularly and beam focus and beam astigmatism is dynamically corrected over the entire deflection field,\nwe can observe disturbances in the exposed relief for both nowadays types of e-beam writers, the shaped e-beam writing system and the Gaussian e-beam writing system. A stable and homogeneous angular current density distribution in the spot is important especially in the case of shaped e-beam lithography systems. A non-homogeneity of the spot over deflection field is seen alongside the field boundaries of both lithography systems.
Keywords: e-beam writer; Gaussian e-beam writing system
Project no.: TE01020233 (CEP), LO1212 (CEP), ED0017/01/01
Funding provider: GA TA ČR, GA MŠk, GA MŠk
Host item entry: Proceedings of the 15th International Seminar on Recent Trends in Charged Particle Optics and Surface Physics Instrumentation, ISBN 978-80-87441-17-6
Note: Související webová stránka: http://www.trends.isibrno.cz/

Institution: Institute of Scientific Instruments AS ČR (web)
Document availability information: Fulltext is available at the institute of the Academy of Sciences.
Original record: http://hdl.handle.net/11104/0260334

Permalink: http://www.nusl.cz/ntk/nusl-253622


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