Original title: Reactive ion etching of polystyrene microspheres
Authors: Domonkos, Mária ; Ižák, Tibor ; Štolcová, L. ; Proška, J. ; Kromka, Alexander
Document type: Papers
Conference/Event: Nanomateriály a nanotechnologie ve stavebnictví 2013, Praha (CZ), 2013-06-12 / 2013-06-12
Year: 2013
Language: eng
Abstract: This article gives a brief insight also into the principle of the nanosphere lithography and various plasma systems focusing on their properties and applicability for a subsequent topographical modification of surfaces prepared by NS lithography. In the experimental part of this study we present a successful manipulation of microspheres by reactive ion etching (RIE). A self-assembled monolayer close-packed array of monodisperse polystyrene microspheres is used as the primary template. The polystyrene microspheres (PM) were processed in capacitively coupled radiofrequency plasma (CCP) RIE system. The influence of process conditions on the PM geometry is systematically studied by scanning electron microscopy. The process conditions are controlled by varying radiofrequency power, total pressure, composition of the gas mixture (ratio O2:CF4) and process duration.
Keywords: Langmuir-Blodgett monolayers; nanosphere lithography; polystyrene microspheres; reactive ion etching
Project no.: GBP108/12/G108 (CEP)
Funding provider: GA ČR
Host item entry: Nanomateriály a nanotechnologie ve stavebnictví 2013, ISBN 978-80-01-05334-8

Institution: Institute of Physics AS ČR (web)
Document availability information: Fulltext is available at the institute of the Academy of Sciences.
Original record: http://hdl.handle.net/11104/0231433

Permalink: http://www.nusl.cz/ntk/nusl-170494


The record appears in these collections:
Research > Institutes ASCR > Institute of Physics
Conference materials > Papers